Al-Cr-O thin films as an efficient hydrogen barrier

被引：56

作者：

Levchuk, Denis ^{[2
]}

Bolt, Harald ^{[2
]}

Doebeli, Max ^{[3
,4
]}

Eggenberger, Simon ^{[1
]}

Widrig, Beno ^{[1
]}

Ramm, Juergen ^{[1
]}

机构：

[1] OC Oerlikon Balzers AG, LI-9496 Balzers, Liechtenstein

[2] Max Planck Inst Plasma Phys, EURATOM Assoc, D-85748 Garching, Germany

[3] Paul Scherrer Inst, CH-8093 Zurich, Switzerland

[4] ETH, CH-8093 Zurich, Switzerland

来源：

SURFACE & COATINGS TECHNOLOGY | 2008年 / 202卷 / 20期

关键词：

hydrogen; barrier; alumina; solid solution; corundum; fusion;

D O I：

10.1016/j.surfcoat.2008.05.012

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Al-Cr-O films are proposed as hydrogen permeation barriers. Layers of a few microns in thickness are able to suppress hydrogen permeability by a factor of 2000 to 3500 at temperatures of 700 degrees C, as has been found in our gas phase permeation experiments. We attribute this excellent efficiency to a dense layer morphology and the possible (pre)-formation of solid solutions in corundum-type structure. These films are deposited by pulsed arc evaporation in a batch-type production system at substrate temperatures of 550 degrees C. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：5043 / 5047

页数：5

共 50 条

[31] Crystal structure and properties of Al2O3-Cr2O3 solid solutions with different Cr2O3 contents [J].

Zhao, Pengda ;

Zhao, Huizhong ;

Yu, Jun ;

Zhang, Han ;

Gao, Hongjun ;

Chen, Qi .

CERAMICS INTERNATIONAL, 2018, 44 (02) :1356-1361

[32] BARRIER EFFECT OF DLC THIN FILMS FOR POTENTIAL APPLICATION IN BIOMEDICINE [J].

Hajkova, Pavlina ;

Volesky, Lukas ;

Cmelik, Jiri .

NANOCON 2015: 7TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION, 2015, :495-499

[33] Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films [J].

Kukli, Kaupo ;

Kemell, Marianna ;

Castan, Helena ;

Duenas, Salvador ;

Seemen, Helina ;

Rahn, Mihkel ;

Link, Joosep ;

Stern, Raivo ;

Heikkila, Mikko J. ;

Ritala, Mikko ;

Leskela, Markku .

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2018, 7 (05) :P287-P294

[34] Low-Temperature Atomic Layer Deposition of α-Al2O3 Thin Films [J].

Aarik, Lauri ;

Mandar, Hugo ;

Ritslaid, Peeter ;

Tarre, Aivar ;

Kozlova, Jekaterina ;

Aarik, Jaan .

CRYSTAL GROWTH & DESIGN, 2021, 21 (07) :4220-4229

[35] Dielectric properties of DC reactive magnetron sputtered Al2O3 thin films [J].

Prasanna, S. ;

Mohan, Rao G. ;

Jayakumar, S. ;

Kannan, M. D. ;

Ganesan, V .

THIN SOLID FILMS, 2012, 520 (07) :2689-2694

[36] Palladium thin films for hydrogen sensing in aqueous electrolytes [J].

Walkner, Sarah ;

Schimo, Gabriela ;

Mardare, Andrei Ionut ;

Hassel, Achim Walter .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2015, 212 (06) :1273-1280

[37] Passivation of cobalt nanocluster assembled thin films with hydrogen [J].

Romero, C. P. ;

Volodin, A. ;

Di Vece, M. ;

Paddubrouskaya, H. ;

Wang, Huan ;

Vantomme, A. ;

Van Haesendonck, C. ;

Lievens, P. .

THIN SOLID FILMS, 2012, 520 (17) :5584-5588

[38] Effect of hydrogen on stability of amorphous silicon thin films [J].

Pietruszko, SM ;

Jang, J .

SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2002, 71 (04) :459-464

[39] Characterization of Hydrogen Gas Sensitivity of ZnO Thin Films [J].

Kong, Young-Min ;

Lee, Hak-Min ;

Huh, Sung-Bo ;

Kim, Sun-Kwang ;

You, Yong-Zoo ;

Kim, Daeil .

KOREAN JOURNAL OF MATERIALS RESEARCH, 2010, 20 (12) :636-639

[40] Electrical resistivity and hydrogen solubility of PdHc thin films [J].

Wagner, Stefan ;

Pundt, Astrid .

ACTA MATERIALIA, 2010, 58 (04) :1387-1394

← 1 2 3 4 5 →