Al-Cr-O thin films as an efficient hydrogen barrier

被引：50

作者：

Levchuk, Denis ^{[2
]}

Bolt, Harald ^{[2
]}

Doebeli, Max ^{[3
,4
]}

Eggenberger, Simon ^{[1
]}

Widrig, Beno ^{[1
]}

Ramm, Juergen ^{[1
]}

机构：

[1] OC Oerlikon Balzers AG, LI-9496 Balzers, Liechtenstein

[2] Max Planck Inst Plasma Phys, EURATOM Assoc, D-85748 Garching, Germany

[3] Paul Scherrer Inst, CH-8093 Zurich, Switzerland

[4] ETH, CH-8093 Zurich, Switzerland

来源：

SURFACE & COATINGS TECHNOLOGY | 2008年 / 202卷 / 20期

关键词：

hydrogen; barrier; alumina; solid solution; corundum; fusion;

D O I：

10.1016/j.surfcoat.2008.05.012

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Al-Cr-O films are proposed as hydrogen permeation barriers. Layers of a few microns in thickness are able to suppress hydrogen permeability by a factor of 2000 to 3500 at temperatures of 700 degrees C, as has been found in our gas phase permeation experiments. We attribute this excellent efficiency to a dense layer morphology and the possible (pre)-formation of solid solutions in corundum-type structure. These films are deposited by pulsed arc evaporation in a batch-type production system at substrate temperatures of 550 degrees C. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：5043 / 5047

页数：5

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