Al-Cr-O thin films as an efficient hydrogen barrier

被引:50
|
作者
Levchuk, Denis [2 ]
Bolt, Harald [2 ]
Doebeli, Max [3 ,4 ]
Eggenberger, Simon [1 ]
Widrig, Beno [1 ]
Ramm, Juergen [1 ]
机构
[1] OC Oerlikon Balzers AG, LI-9496 Balzers, Liechtenstein
[2] Max Planck Inst Plasma Phys, EURATOM Assoc, D-85748 Garching, Germany
[3] Paul Scherrer Inst, CH-8093 Zurich, Switzerland
[4] ETH, CH-8093 Zurich, Switzerland
来源
SURFACE & COATINGS TECHNOLOGY | 2008年 / 202卷 / 20期
关键词
hydrogen; barrier; alumina; solid solution; corundum; fusion;
D O I
10.1016/j.surfcoat.2008.05.012
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Al-Cr-O films are proposed as hydrogen permeation barriers. Layers of a few microns in thickness are able to suppress hydrogen permeability by a factor of 2000 to 3500 at temperatures of 700 degrees C, as has been found in our gas phase permeation experiments. We attribute this excellent efficiency to a dense layer morphology and the possible (pre)-formation of solid solutions in corundum-type structure. These films are deposited by pulsed arc evaporation in a batch-type production system at substrate temperatures of 550 degrees C. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:5043 / 5047
页数:5
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