Kinetic rules of precipitation of thin films of titanium dioxide from the gas phase containing titanium tetraisopropylate

被引：2

作者：

Baryshnikova, M. V. ^{[1
]}

Aleksandrov, S. E. ^{[1
]}

Filatov, L. A. ^{[1
]}

Berberov, A. B. ^{[1
]}

机构：

[1] St Petersburg State Polytech Univ, St Petersburg 195251, Russia

来源：

RUSSIAN JOURNAL OF GENERAL CHEMISTRY | 2013年 / 83卷 / 08期

关键词：

ATOMIC LAYER DEPOSITION;

D O I：

10.1134/S1070363213080215

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Precipitation of titanium dioxide layers from the gas phase in the reaction system containing titanium tetraisopropylate and oxygen at the total pressure 1 kPa is studied. It is shown that in the range of 300-500A degrees C the precipitation proceeds in the kinetic regime and is accompanied by the formation of layers of monotonous thickness containing nanocrystalline phases of anatase and rutile. In the temperature range 300-350A degrees C the activation energy value was 92.7 kJ mol(-1), and at higher temperatures (up to 500A degrees C) it decreased to 17.5 kJ mol(-1). The increase in the precipitation temperature caused the increase in relative amount of rutile in the precipitated layers.

引用

页码：1596 / 1600

页数：5

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