Single Germanium Quantum-dot Placement Along With Self-Aligned Electrodes for Effective Management of Single Charge Tunneling

被引:11
作者
Chen, Inn-Hao [1 ,2 ]
Chen, Kuan-Hung [1 ,2 ]
Lai, Wei-Ting [1 ,2 ]
Li, Pei-Wen [1 ,2 ]
机构
[1] Natl Cent Univ, Dept Elect Engn, Jhongli 320, Taiwan
[2] Natl Cent Univ, Ctr Nano Sci & Technol, Jhongli 320, Taiwan
关键词
Ge; quantum dot (QD) placement; self-aligned electrode; single electron;
D O I
10.1109/TED.2012.2217973
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We demonstrated the controlled placement of a Ge quantum dot (QD) along with tunnel-junction engineering in a self-organized approach for the effective management of single charge tunneling. In this approach, a single-Ge-QD (similar to 11 nm) self-aligning with nickel-polycide electrodes is realized by thermally oxidizing a SiGe nanorod that bridges a 15-nm-wide nanotrench in close proximity to electrodes via a spacer bilayer of Si3N4/SiO2. The fabricated Ge-QD single-hole transistor exhibits clear Coulomb oscillation and Coulomb diamond behaviors at T = 77 K-150 K, providing a way to analyze the electronic structure of the Ge QD.
引用
收藏
页码:3224 / 3230
页数:7
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