N+ ion beam irradiation as a strategy to enhance the electrical conductivity of polycrystalline diamond thin films

被引:1
作者
Bommidi, Varalakshmi [1 ]
Kandasami, Asokan [2 ]
Srikanth, Vadali V. S. S. [1 ]
机构
[1] Univ Hyderabad, Sch Engn Sci & Technol, Hyderabad 500046, Telangana, India
[2] Inter Univ Accelerator Ctr, Mat Sci Div, Aruna Asaf Ali Marg, New Delhi 110067, India
关键词
Diamond; Thin films; Surfaces; Ion implantation; Electrical conductivity; IMPLANTATION;
D O I
10.1016/j.matlet.2019.01.085
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
100 keV N-14(+) ion beam (at fluences of 10(16) and 10(17) ions/cm(2)) irradiation was used to alter the sp(2) bonded carbon networks (as revealed by Raman scattering analysis) and incorporate N atoms into the surface and sub-surface regions (as revealed by Rutherford backscattering analysis) in the typical polycrystalline diamond films and as a consequence, the electrical conductivity of the diamond thin films was enhanced several orders in comparison to the as-deposited film. The enhancement in electrical conductivity was achieved with negligible morphological and structural changes in the diamond thin film. This work demonstrates an easy and effective way of altering the electrical conductivity of diamond thin films to a required sub-surface depth. (C) 2019 Elsevier B.V. All rights reserved.
引用
收藏
页码:172 / 175
页数:4
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