A comprehensive diagram to grow InAlN alloys by plasma-assisted molecular beam epitaxy

被引：42
作者：
Fernandez-Garrido, S. [1 ]
Gacevic, Z.
Calleja, E.
机构：
[1] Univ Politecn Madrid, ISOM, E-28040 Madrid, Spain
来源：
APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 19期
关键词：
aluminium compounds; III-V semiconductors; indium compounds; molecular beam epitaxial growth; pyrolysis; semiconductor growth; stoichiometry; surface morphology;
D O I：
10.1063/1.3026541
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Indium incorporation and surface morphology of InAlN layers grown on (0001) GaN by plasma-assisted molecular beam epitaxy were investigated as a function of the impinging In flux and the substrate temperature in the 450-610 degrees C range. In incorporation was found to decrease with substrate temperature due to thermal decomposition of the growing layer, while for a given temperature it increased with the impinging In flux until stoichiometry was reached at the growth front. The InN losses during growth followed an Arrhenius behavior characterized by an activation energy of 2.0 eV. A growth diagram highly instrumental to identify optimum growth conditions was established.
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页数：3
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