GaN-based high-frequency devices and circuits: A Fraunhofer perspective

被引:10
作者
Waltereit, Patrick [1 ]
Bronner, Wolfgang [1 ]
Quay, Ruediger [1 ]
Dammann, Michael [1 ]
Caesar, Markus [1 ]
Mueller, Stefan [1 ]
van Raay, Friedbert [1 ]
Kiefer, Rudolf [1 ]
Brueckner, Peter [1 ]
Kuehn, Jutta [1 ]
Musser, Markus [1 ]
Kirste, Lutz [1 ]
Haupt, Christian [1 ]
Pletschen, Wilfried [1 ]
Lim, Taek [1 ]
Aidam, Rolf [1 ]
Mikulla, Michael [1 ]
Ambacher, Oliver [1 ]
机构
[1] Fraunhofer Inst Appl Solid State Phys, D-79108 Freiburg, Germany
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2012年 / 209卷 / 03期
关键词
GaN; HEMT; MMIC; reliability; ELECTRON-MOBILITY TRANSISTORS; BUFFER LEAKAGE; ALGAN/GAN; GROWTH;
D O I
10.1002/pssa.201100452
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present the current status of our technology for GaN-based HEMTs and MMICs as well as results ranging from the L-band up to the W-band. Epitaxial growth is carried out on 4H-SiC(0001) substrates by both MOCVD and MBE. Processing is done using standard III-V equipment including both frontside and backside processing. For L-band power bars we arrive at output powers, efficiencies and gains beyond 100 W, 60% and 17 dB, all measured under cw conditions at 50 V drain bias. The X-band MMICs are characterized by a high efficiency above 40% for two-stage amplifiers. Towards mm-wave applications we have fabricated HEMTs with transit frequencies above 100 GHz and W-band MMICs delivering 0.5W/mm at 94 GHz with 7% PAE. First quaternary InAlGaN barriers show promising results for this new materials system. Reliability tests return a very good long-term stability of our devices even at an elevated channel temperature of 200 degrees C with an extrapolated lifetime of 5 x 10(5). Initial space capability tests including total ion dose radiation insensitivity, radiation displacement damage, hydrogen poisoning and single event effect are successfully passed. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:491 / 496
页数:6
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