Langmuir probe measurements in inductively coupled CF4 plasmas

被引:5
|
作者
Huang, S [1 ]
Ning, ZY [1 ]
Xin, Y [1 ]
Di, XL [1 ]
机构
[1] Suzhou Univ, Dept Phys, Suzhou 215006, Peoples R China
来源
SURFACE & COATINGS TECHNOLOGY | 2006年 / 200卷 / 12-13期
基金
中国国家自然科学基金;
关键词
inductively coupled plasmas; Langmuir probe; electron temperature;
D O I
10.1016/j.surfcoat.2005.04.006
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The characteristics of low-pressure inductively coupled CF4 plasmas have been investigated using a Langmuir probe. The electrons gain energy through the collisionless heating mechanism. In addition, the plasma has two electron populations: low temperature population of electrons with high density, and high temperature population of electrons with low density. With the increase of radio-frequency input power, the former temperature T-cc, the latter temperature T-he, and mean electron temperature T-e decrease, while their densities n(cc), n(he), n(c) increase. This phenomenon has been explained by the thermodynamic equilibrium of the collision between the electrons and radicals in the plasma. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:3963 / 3968
页数:6
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