Structural studies of copper sulfide films: effect of ambient atmosphere

被引:90
作者
Kundu, Manisha [1 ,2 ]
Hasegawa, Tsuyoshi [1 ,2 ,3 ]
Terabe, Kazuya [2 ,3 ]
Yamamoto, Kazuhiro [4 ]
Aono, Masakazu [1 ,2 ]
机构
[1] Natl Inst Mat Sci, Int Ctr Mat Nanoarchitecton, Tsukuba, Ibaraki 3050044, Japan
[2] Japan Sci & Technol Agcy, Int Cooperat Res Project, Kawaguchi, Saitama 3320012, Japan
[3] Natl Inst Mat Sci, Nano Syst Funct Ctr, Tsukuba, Ibaraki 3050044, Japan
[4] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058565, Japan
关键词
copper sulfide; x-ray photoelectron spectroscopy; x-ray diffraction;
D O I
10.1088/1468-6996/9/3/035011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We examined the structural properties of copper sulfide films as a function of the sulfurization time of 70-nm-thick Cu films. Copper sulfide films with various phases such as mixed metallic Cu-chalcocite, chalcocite, roxbyite, and covellite phases were formed with increasing sulfurization time. To evaluate the structural stability of various films, all the films were exposed to the ambient atmosphere for the same amount of time. Although the phase structure and stoichiometry of the films were maintained at a greater depth, the near-surface region of the films was oxidized and covered with overlayers of oxide, hydroxide, and/or sulfate species due to the exposure and reaction with the ambient atmosphere. The oxygen uptake and its reactivity with the copper sulfide film surfaces were enhanced with increasing sulfur content of the films. In addition, the type of divalent state of copper formed on the film surfaces depended on the phase structure, composition, and stoichiometry of the films.
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页数:6
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