Molecular glass resists as high-resolution patterning materials

被引：100
作者：
De Silva, Anuja [2 ]
Felix, Nelson M. [3 ]
Ober, Christopher K. [1 ]
机构：
[1] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14850 USA
[2] Cornell Univ, Dept Chem & Biol Chem, Baker Lab, Ithaca, NY 14850 USA
[3] Cornell Univ, Dept Chem & Biomol Engn, Ithaca, NY 14850 USA
来源：
ADVANCED MATERIALS | 2008年 / 20卷 / 17期
关键词：
D O I：
10.1002/adma.200800763
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The success of the semiconductor industry is based on the ability to fabricate hundreds of millions of devices on a single chip. In order to fulfill the ever-shrinking feature sizes, the industry requires new patternable materials in order to operate in the sub-50 nm regime. Molecular glass (MG) resists are a new type of patterning material that has gained considerable attention over the past few years. This Research News article describes the chemical and structural aspects of MGs as well as important concepts of MG resist design. We also highlight some of the recent advances in high-resolution patterning capabilities with next-generation imaging tools.
引用
收藏
页码：3355 / 3361
页数：7
相关论文
共 34 条
  • [1] Vitrigens - Part 2. Low molecular weight organic systems with high glass transition temperatures
    Alig, I
    Braun, D
    Langendorf, R
    Wirth, HO
    Voigt, M
    Wendorff, JH
    [J]. JOURNAL OF MATERIALS CHEMISTRY, 1998, 8 (04) : 847 - 851
  • [2] ANDRE X, 2007, SPIE INT SOC OPT ENG, V6519
  • [3] Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography
    Chang, SW
    Ayothi, R
    Bratton, D
    Yang, D
    Felix, N
    Cao, HB
    Deng, H
    Ober, CK
    [J]. JOURNAL OF MATERIALS CHEMISTRY, 2006, 16 (15) : 1470 - 1474
  • [4] Molecular glass resists for high-resolution patterning
    Dai, Junyan
    Chang, Seung Wook
    Hamad, Alyssandrea
    Yang, Da
    Felix, Nelson
    Ober, Christopher K.
    [J]. CHEMISTRY OF MATERIALS, 2006, 18 (15) : 3404 - 3411
  • [5] Study of the structure-properties relationship of phenolic molecular glass resists for next generation photolithography
    De Silva, Anuja
    Lee, Jin-Kyun
    Andre, Xavier
    Felix, Nelson M.
    Cao, Heidi B.
    Deng, Hai
    Ober, Christopher K.
    [J]. CHEMISTRY OF MATERIALS, 2008, 20 (04) : 1606 - 1613
  • [6] Stochastic simulation studies of molecular resists
    Drygiannakis, D.
    Patsis, G. P.
    Raptis, I.
    Niakoula, D.
    Vidali, V.
    Couladouros, E.
    Argitis, P.
    Gogolides, E.
    [J]. MICROELECTRONIC ENGINEERING, 2007, 84 (5-8) : 1062 - 1065
  • [7] Calix[4]resorcinarene derivatives as high-resolution resist materials for Supercritical CO2 processing
    Felix, Nelson M.
    De Silva, Anuja
    Ober, Christopher K.
    [J]. ADVANCED MATERIALS, 2008, 20 (07) : 1303 - +
  • [8] Dissolution phenomena of phenolic molecular glass photoresist films in supercritical CO2
    Felix, Nelson M.
    De Silva, Anuja
    Luk, Camille Man Yin
    Ober, Christopher K.
    [J]. JOURNAL OF MATERIALS CHEMISTRY, 2007, 17 (43) : 4598 - 4604
  • [9] High-resolution patterning of molecular glasses using supercritical carbon dioxide
    Felix, NM
    Tsuchiya, K
    Ober, CK
    [J]. ADVANCED MATERIALS, 2006, 18 (04) : 442 - +
  • [10] New photoresist based on amorphous low molecular weight polyphenols
    Hirayama, T
    Shiono, D
    Hada, H
    Onodera, J
    [J]. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2004, 17 (03) : 435 - 440
1234