Molecular glass resists as high-resolution patterning materials

被引：106

作者：

De Silva, Anuja ^{[2
]}

Felix, Nelson M. ^{[3
]}

Ober, Christopher K. ^{[1
]}

机构：

[1] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14850 USA

[2] Cornell Univ, Dept Chem & Biol Chem, Baker Lab, Ithaca, NY 14850 USA

[3] Cornell Univ, Dept Chem & Biomol Engn, Ithaca, NY 14850 USA

来源：

ADVANCED MATERIALS | 2008年 / 20卷 / 17期

关键词：

D O I：

10.1002/adma.200800763

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The success of the semiconductor industry is based on the ability to fabricate hundreds of millions of devices on a single chip. In order to fulfill the ever-shrinking feature sizes, the industry requires new patternable materials in order to operate in the sub-50 nm regime. Molecular glass (MG) resists are a new type of patterning material that has gained considerable attention over the past few years. This Research News article describes the chemical and structural aspects of MGs as well as important concepts of MG resist design. We also highlight some of the recent advances in high-resolution patterning capabilities with next-generation imaging tools.

引用

页码：3355 / 3361

页数：7

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