Contacting n+ Poly-Si Junctions with Fired AZO Layers: A Promising Approach for High Temperature Passivated Contact Solar Cells

被引:0
|
作者
Bruhat, Elise [1 ,2 ]
Desrues, Thibaut [1 ,2 ]
Blanc-Pelissier, Daniele [3 ]
Martel, Benoit [1 ,2 ]
Cabal, Raphael [1 ,2 ]
Dubois, Sebastien [1 ,2 ]
机构
[1] Univ Grenoble Alpes, INES, F-73375 Le Bourget Du Lac, France
[2] CEA, LITEN, Dept Solar Technol, F-73375 Le Bourget Du Lac, France
[3] Univ Lyon, Inst Nanotechnol Lyon INL, Ecole Cent Lyon, INSA Lyon,CNRS,UMR5270, Villeurbanne, France
来源
2019 IEEE 46TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC) | 2019年
关键词
Aluminum Zinc Oxide; passivating contacts; silicon solar cells; thermal treatment; ZINC-OXIDE;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Polysilicon (poly-Si) based passivating contacts are promising to improve silicon solar cells conversion efficiency. However, the use of Transparent Conductive Oxides (TCO) has to be considered to improve lateral conductivity while maintaining good optical and surface passivation properties especially for bifacial devices. In this work different Aluminum-doped Zinc Oxide (AZO) based layers have been investigated after high temperature firing steps to contact Phosphorus-doped poly-Si layers. Contact resistivity below 100 m Omega.cm(2) at the AZO/n(+) poly-Si interface and stable implied open circuit voltage values (> 715 mV) have been obtained for firing temperatures from 550 degrees C to 900 degrees C. Moreover, the use of capping layers allows to maintain highly conductive AZO layers upon annealing. This novel high temperature contacting method via indium-free TCOs, is particularly interesting for the industrial integration of poly-Si based passivated contacts and provides new perspectives for advanced homojunction solar cells.
引用
收藏
页码:2319 / 2324
页数:6
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