Real-Time Microscopy of Graphene Growth on Epitaxial Metal Films: Role of Template Thickness and Strain

被引:21
作者
Sutter, Peter [1 ]
Ciobanu, Cristian V. [2 ]
Sutter, Eli [1 ]
机构
[1] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA
[2] Colorado Sch Mines, Dept Mech Engn, Mat Sci Program, Golden, CO 80401 USA
关键词
CHEMICAL-VAPOR-DEPOSITION; TOTAL-ENERGY CALCULATIONS; FEW-LAYER GRAPHENE; WAVE BASIS-SET; LARGE-AREA; RUTHENIUM; RU(0001);
D O I
10.1002/smll.201200196
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Epitaxial transition metal films have recently been introduced as substrates for the scalable synthesis of transferable graphene. Here, real-time microscopy is used to study graphene growth on epitaxial Ru films on sapphire. At high temperatures, high-quality graphene grows in macroscopic (>100 mu m) domains to full surface coverage. Graphene nucleation and growth characteristics on thin (100 nm) Ru films are consistent with a pure surface chemical vapor deposition process, without detectable contributions from C segregation. Experiments on thicker (1 mu m) films show a systematic suppression of the C uptake into the metal to levels substantially below those expected from bulk C solubility data, consistent with a strain-induced reduction of the C solubility due to gas bubbles acting as stressors in the epitaxial Ru films. The results identify two powerful approachesi) limiting the template thickness and ii) tuning the interstitial C solubility via strainfor controlling graphene growth on metals with high C solubility, such as Ru, Pt, Rh, Co, and Ni.
引用
收藏
页码:2250 / 2257
页数:8
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