K0.5Na0.5NbO3 Thin Films Prepared by Chemical Solution Deposition

被引：8
|
作者：
Cakare-Samardzija, L. [1 ]
Malic, B. [1 ]
Kosec, M. [1 ]
机构：
[1] Jozef Stefan Inst, SI-1000 Ljubljana, Slovenia
来源：
FERROELECTRICS | 2008年 / 370卷
关键词：
Chemical solution deposition; KNN thin films; properties;
D O I：
10.1080/00150190802384450
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The thin films of potassium sodium niobate (K0.5Na0.5)NbO3 on Pt(111)/TiO2/SiO2/Si substrates have been prepared by chemical solution deposition. The stoichiometric sols were synthesized from corresponding alkali metal ethoxides or acetates and niobium ethoxide in 2-methoxyethanol. The thin film quality is affected by choice of alkali metal precursors. Thin films prepared from the acetate-based sol upon heating to 670C crystallize in pure perovskite phase. The dielectric permittivity of the 350 nm thick KNN film at 10 kHz is 533 and the dielectric loss factor is 0.068.
引用
收藏
页码：113 / 118
页数：6
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