Fabrication of Ti ohmic contact to n-type 6H-SiC without high-temperature annealing

被引:2
|
作者
Chang Shao-Hui [1 ]
Liu Xue-Chao [1 ]
Huang Wei [1 ]
Xiong Ze [1 ]
Yang Jian-Hua [1 ]
Shi Er-Wei [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 201800, Peoples R China
基金
中国国家自然科学基金;
关键词
Ti contact; 6H-SiC; HF acid; H-2; treatment; INFRARED-SPECTROSCOPY; HYDROGEN TERMINATION; SURFACE-MORPHOLOGY; HF TREATMENT; FERMI-LEVEL; SI(111); PASSIVATION; SCHOTTKY; EPITAXY; NICKEL;
D O I
10.1088/1674-1056/21/9/096801
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The effect of surface morphology of 6H-SiC substrate on the ohmic contact properties of Ti/6H-SiC structure is studied. The H-terminated surface on Si-face 6H-SiC is obtained by both dipping SiC into HF acid solution for 15 s and thermal heating SiC in hydrogen atmosphere at 1100 degrees C for 10 min, while the H-terminated surface on C-face 6H-SiC could be obtained only by the latter method. Ti is deposited on Si-face and C-face SiC substrates with H-terminated surfaces and ohmic contact is obtained without high-temperature annealing.
引用
收藏
页数:4
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