Multilevel recording in Bi-deficient Pt/BFO/SRO heterostructures based on ferroelectric resistive switching targeting high-density information storage in nonvolatile memories

被引:20
作者
Jimenez, David [1 ]
Miranda, Enrique [1 ]
Tsurumaki-Fukuchi, Atsushi [2 ]
Yamada, Hiroyuki [2 ,3 ]
Sune, Jordi [1 ]
Sawa, Akihito [2 ]
机构
[1] Univ Autonoma Barcelona, Escola Engn, Dept Engn Elect, E-08193 Barcelona, Spain
[2] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058562, Japan
[3] JST, PRESTO, Kawaguchi, Saitama 3320012, Japan
关键词
ELECTRORESISTANCE; TRANSPORT;
D O I
10.1063/1.4855155
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate the feasibility of multilevel recording in Pt/Bi1-delta FeO3/SrRuO3 capacitors using the ferroelectric resistive switching phenomenon exhibited by the Pt/Bi1-delta FeO3 interface. A tunable population of up and down ferroelectric domains able to modulate the Schottky barrier height at the Pt/Bi1-delta FeO3 interface can be achieved by means of either a collection of SET/RESET voltages or current compliances. This programming scheme gives rise to well defined resistance states, which form the basis for a multilevel storage nonvolatile memory. (C) 2013 AIP Publishing LLC.
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页数:4
相关论文
共 27 条
[1]   FERROELECTRIC SCHOTTKY DIODE [J].
BLOM, PWM ;
WOLF, RM ;
CILLESSEN, JFM ;
KRIJN, MPCM .
PHYSICAL REVIEW LETTERS, 1994, 73 (15) :2107-2110
[2]  
Chanthbouala A, 2012, NAT MATER, V11, P860, DOI [10.1038/nmat3415, 10.1038/NMAT3415]
[3]  
Chanthbouala A, 2012, NAT NANOTECHNOL, V7, P101, DOI [10.1038/nnano.2011.213, 10.1038/NNANO.2011.213]
[4]   The conduction mechanism of large on/off ferroelectric diode currents in epitaxial (111) BiFeO3 thin film [J].
Chen, Zhihui ;
He, Long ;
Zhang, Fan ;
Jiang, Jun ;
Meng, Jianwei ;
Zhao, Boyuan ;
Jiang, Anquan .
JOURNAL OF APPLIED PHYSICS, 2013, 113 (18)
[5]   Switchable Ferroelectric Diode and Photovoltaic Effect in BiFeO3 [J].
Choi, T. ;
Lee, S. ;
Choi, Y. J. ;
Kiryukhin, V. ;
Cheong, S. -W. .
SCIENCE, 2009, 324 (5923) :63-66
[6]   Resistive switching in metal-ferroelectric-metal junctions [J].
Contreras, JR ;
Kohlstedt, H ;
Poppe, U ;
Waser, R ;
Buchal, C ;
Pertsev, NA .
APPLIED PHYSICS LETTERS, 2003, 83 (22) :4595-4597
[7]  
Esaki, 1971, IBM TECH DISCL B, V13, P2161
[8]   Giant tunnel electroresistance for non-destructive readout of ferroelectric states [J].
Garcia, V. ;
Fusil, S. ;
Bouzehouane, K. ;
Enouz-Vedrenne, S. ;
Mathur, N. D. ;
Barthelemy, A. ;
Bibes, M. .
NATURE, 2009, 460 (7251) :81-84
[9]   Tunneling Electroresistance Effect in Ferroelectric Tunnel Junctions at the Nanoscale [J].
Gruverman, A. ;
Wu, D. ;
Lu, H. ;
Wang, Y. ;
Jang, H. W. ;
Folkman, C. M. ;
Zhuravlev, M. Ye. ;
Felker, D. ;
Rzchowski, M. ;
Eom, C. -B. ;
Tsymbal, E. Y. .
NANO LETTERS, 2009, 9 (10) :3539-3543
[10]   Charge trapping in high-k gate stacks due to the bilayer structure itself [J].
Jameson, John R. ;
Griffin, Peter B. ;
Plummer, James D. ;
Nishi, Y. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (08) :1858-1867