Method for distortion correction of multi-layered surface reconstruction using time-gated wavefront sensing approach

被引:3
作者
Tan, C. S. [1 ]
Wang, X. [2 ]
Ng, Y. H. [3 ]
Lim, W. K. [1 ]
Chai, T. Y. [4 ]
机构
[1] Multimedia Univ, Fac Engn, Cyberjaya 63100, Selangor, Malaysia
[2] Monash Univ Sunway Campus, Sch Engn, Selangor 46150, Malaysia
[3] Univ Tunku Abdul Rahman, Fac Engn & Sci, Kuala Lumpur 53300, Malaysia
[4] Cardiovasc Imaging & Dynam, B-3000 Louvain, Belgium
关键词
Gated Imaging; adaptive optics; microlens; multi-layered wavefront; 2ND-HARMONIC GENERATION; REFLECTOMETRY; ELLIPSOMETRY; ABERRATIONS; ACCURACY; LIGHT;
D O I
10.2971/jeos.2013.13034
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In order to estimate the multi-layer surface profile and to detect the inter-layer surfaces defects, gated wavefront sensing approach has been proposed in the previous works [1, 2]. However, the proposed methodology measures the wavefront that has been distorted by its prior surfaces (reflected wavefront) or post surfaces (transmitted wavefront). Analysis has to be performed to estimate the multi-layer wavefront sensing by taking into consideration the multi-layer surfaces condition. For reflected wavefront, the bottom layer(s) wavefront is (are) being distorted twice via separate interface points while traveling back to the lenslet arrays through our observation for the slope and phase measurement. The subsequent reconstructed surfaces are not accurate and corrected. Thus, a discrete layer correction technique for the surface reconstruction has been proposed to enhance the reconstruction accuracy by using the upper/top layers wavefront information. This paper discusses on the case of 2-layer system, where the reflected wavefront from the bottom layer has been distorted and its surface reconstruction has been corrected. The results show that the distortion is significant and the correction is deemed necessary for industrial application such as in wafer warpage inter-layer profile estimation.
引用
收藏
页码:1 / 7
页数:7
相关论文
共 41 条
[1]  
ABELES F, 1948, ANN PHYS-PARIS, V3, P504
[2]   Second harmonic generation for noninvasive metrology of silicon-on-insulator wafers [J].
Alles, Michael L. ;
Pasternak, Robert ;
Lu, Xiong ;
Tolk, Norman H. ;
Schrimpf, Ronald D. ;
Fleetwood, Daniel M. ;
Dolan, Robert P. ;
Standley, Robert W. .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2007, 20 (02) :107-113
[3]  
[Anonymous], 2008, OPTICAL COHERENCE TO
[4]  
[Anonymous], 2001, Surface Modes in Physics
[5]   Digital Shack-Hartmann wavefront sensor for toroidal surface measurement - art. no. 661644 [J].
Bai, N. ;
Zhao, Li. P. ;
Li, X. ;
Fang, Zhong. P. .
OPTICAL MEASUREMENT SYSTEMS FOR INDUSTRIAL INSPECTION V, PTS 1 AND 2, 2007, 6616 :61644-61644
[6]  
Born M., 1999, Principles of Optics: Electromagnetic Theory of Propagation, Interference and Diffraction of Light, V7th
[7]   Gated viewing and high-accuracy three-dimensional laser radar [J].
Busck, J ;
Heiselberg, H .
APPLIED OPTICS, 2004, 43 (24) :4705-4710
[8]   Accuracy of Zernike polynomials in characterizing optical aberrations and the corneal surface of the eye [J].
Carvalho, LA .
INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 2005, 46 (06) :1915-1926
[9]   Pulsed-terahertz reflectometry for health monitoring of ceramic thermal barrier coatings [J].
Chen, Chia-Chu ;
Lee, Dong-Joon ;
Pollock, Tresa ;
Whitaker, John F. .
OPTICS EXPRESS, 2010, 18 (04) :3477-3486
[10]   Validation of a clinical Shack-Hartmann aberrometer [J].
Cheng, X ;
Himebaugh, NL ;
Kollbaum, PS ;
Thibos, LN ;
Bradley, A .
OPTOMETRY AND VISION SCIENCE, 2003, 80 (08) :587-595