Growth properties and resistive switching effects of diamond-like carbon films deposited using a linear ion source

被引:6
|
作者
Dai, Wei [1 ,2 ]
Ke, Peiling [2 ]
Wang, Aiying [2 ]
机构
[1] Korea Inst Sci & Technol, Seoul 130650, South Korea
[2] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo Key Lab Marine Protect Mat, Ningbo 315201, Zhejiang, Peoples R China
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2013年 / 31卷 / 03期
基金
中国国家自然科学基金;
关键词
AMORPHOUS-CARBON; COATINGS; BEHAVIOR; PLASMA;
D O I
10.1116/1.4803741
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Diamond-like carbon (DLC) films were prepared using an anode-layer linear ion beam source with C2H2 as the precursor and various negative bias voltages. The growth properties, microstructures, mechanical properties, and the resistive switching behaviors of the as-deposited DLC films were investigated as a function of bias voltage. The results showed that adjusting the bias voltage could vary the carbon atomic bonding structure (sp(3)/sp(2) carbon hybridized bonding) of the films. The sp(3)/sp(2) ratio initially increased as bias voltage increased and then decreased once the bias voltage exceeded -100 V. The variations in the film hardness and residual stress at different bias voltages were similar in profile to the sp(3) bond fractions, indicating that both the residual stress and the mechanical properties of the DLC films were highly dependent on sp(3)-C bonding structures. The resistive switching characteristics of the DLC films were studied via a Cu/DLC/Pt cell structure. It was found that the bias voltages had a significant influence on the resistive switching behaviors of the DLC films. The film deposited with a bias voltage of 0V showed excellent resistive switching effects with an ON/OFF ratio higher than 70 and device yield of about 90%, while the films deposited with higher bias voltages presented poor resistive switching effects. The sp(2)/sp(3) ratio of the films was believed to account for the favorable resistive switching performances. (C) 2013 American Vacuum Society.
引用
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页数:6
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