Photonic crystals for the visible spectrum by holographic lithography

We describe a general and flexible technique for the fabrication of three-dimensional photonic crystals that is particularly well adapted to the production of structures with the sub-micron periodicity required for applications in the visible optical spectrum. Three-dimensional microstructure is generated by using a four-beam laser interference pattern to expose a thick layer of photoresist. Exposed areas are rendered insoluble; unexposed areas are dissolved away leaving a three-dimensional photonic crystal formed of cross-linked polymer with air-filled voids. The polymeric structure may be used as a template for the production of photonic crystals with higher refractive index contrast. Photonic crystals made of polymer and of TiO2 have been characterized by scanning electron microscopy and by optical diffraction measurements.