3D global analysis of CZ-Si growth in a transverse magnetic field with various crystal growth rates

被引:17
作者
Liu, Lijun [1 ]
Kakimoto, Koichi [1 ]
机构
[1] Kyushu Univ, Appl Mech Res Inst, Kasuga, Fukuoka 8168580, Japan
关键词
Computer simulation; Interfaces; Magnetic fields; Magnetic field assisted Czochralski method; Semiconducting silicon;
D O I
10.1016/j.jcrysgro.2004.11.185
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A series of computations were performed for Czochralski silicon crystal growth in a transverse magnetic field with different crystal growth rates by using a recently developed three-dimensional global model. The effects of the transverse magnetic field and crystal growth rate on the melt-crystal interface were numerically investigated. It was found that the interface shape is three-dimensional when the crystal is not rotating, while it becomes nearly two-dimensional when the crystal is rotating, even at a low rotation rate. The temperature gradient in the axial direction at the melt-crystal interface increases with increase in crystal growth rate except near the crystal edge, where it changes oppositely. (C) 2004 Elsevier B. V. All rights reserved.
引用
收藏
页码:E1521 / E1526
页数:6
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