Chemical selective microstructural analysis of thin film using resonant x-ray reflectivity

被引：5
作者：
Nayak, Maheswar [1 ]
Lodha, G. S. [1 ]
机构：
[1] Raja Ramanna Ctr Adv Technol, Ind Synchrotrons Utilizat Div, Xray Opt Sect, Indore 452013, Madhya Pradesh, India
来源：
JOURNAL OF APPLIED PHYSICS | 2013年 / 114卷 / 02期
关键词：
SCATTERING; OXIDE; SURFACES; DEVICE; MOCVD;
D O I：
10.1063/1.4812245
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Strong modulations of the reflected x-ray intensities near the respective absorption edges of the constituent materials promise to determine layer composition of thin film structures along with spectroscopic like information. Near the absorption edge, the orders of magnitude more contrast beyond the pure electron density distributions of materials find an approach to overcome the low density difficulty of the conventional x-ray reflectivity technique. These aspects are explained by experimental studies on partially decomposed boron nitride thin films. Chemical composition profile is determined from free surface to the embedded buried layer with depth resolution in nanometer scale. The results of resonant reflectivity for chemical analysis are correlated with depth dependent x-ray photo electron spectroscopy. (C) 2013 AIP Publishing LLC.
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页数：8
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