Digital versus analog resistive switching depending on the thickness of nickel oxide nanoparticle assembly

被引:60
作者
Kim, Hyung Jun [1 ]
Baek, Yoon-Jae [1 ]
Choi, Young Jin [2 ]
Kang, Chi Jung [2 ]
Lee, Hyun Ho [3 ]
Kim, Hyun-Mi [4 ]
Kim, Ki-Bum [4 ]
Yoon, Tae-Sik [1 ]
机构
[1] Myongji Univ, Dept Mat Sci & Engn, Gyeonggi Do 449728, South Korea
[2] Myongji Univ, Dept Phys, Gyeonggi Do 449728, South Korea
[3] Myongji Univ, Dept Chem Engn, Gyeonggi Do 449728, South Korea
[4] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea
基金
新加坡国家研究基金会;
关键词
CHARGE-LIMITED CURRENTS; NIO; DEVICE;
D O I
10.1039/c3ra42683a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The thickness-dependent digital versus analog resistive switching of nickel oxide (NiOx) nanoparticle assemblies was investigated in a Ti/NiOx/Pt structure. The NiiO(x) nanoparticles were chemically synthesized with similar to 5 nm diameter. The Ti/NiiO(x)/Pt structure with assembly thickness of similar to 60 nm exhibited the digital-type bipolar resistive switching. However, the assembly with a thickness of similar to 90 nm presented analog resistive switching with gradually decreasing resistance when sweeping -V while increasing resistance after applying +V. Repeating -V pulses decreased the resistance sequentially, but the high resistance was restored sequentially by repeating +V pulses, which is analogous to the potentiation and depression of adaptive synaptic motion.
引用
收藏
页码:20978 / 20983
页数:6
相关论文
共 24 条
[1]   High precision tuning of state for memristive devices by adaptable variation-tolerant algorithm [J].
Alibart, Fabien ;
Gao, Ligang ;
Hoskins, Brian D. ;
Strukov, Dmitri B. .
NANOTECHNOLOGY, 2012, 23 (07)
[2]   Tunable threshold resistive switching characteristics of Pt-Fe2O3 core-shell nanoparticle assembly by space charge effect [J].
Baek, Yoon-Jae ;
Hu, Quanli ;
Yoo, Jae Woo ;
Choi, Young Jin ;
Kang, Chi Jung ;
Lee, Hyun Ho ;
Min, Seok-Hong ;
Kim, Hyun-Mi ;
Kim, Ki-Bum ;
Yoon, Tae-Sik .
NANOSCALE, 2013, 5 (02) :772-779
[3]   SWITCHING AND NEGATIVE RESISTANCE IN THIN FILMS OF NICKEL OXIDE [J].
BRUYERE, JC ;
CHAKRAVERTY, BK .
APPLIED PHYSICS LETTERS, 1970, 16 (01) :40-+
[4]   An electrically modifiable synapse array of resistive switching memory [J].
Choi, Hyejung ;
Jung, Heesoo ;
Lee, Joonmyoung ;
Yoon, Jaesik ;
Park, Jubong ;
Seong, Dong-Jun ;
Lee, Wootae ;
Hasan, Musarrat ;
Jung, Gun-Young ;
Hwang, Hyunsang .
NANOTECHNOLOGY, 2009, 20 (34)
[5]   Physical models of size-dependent nanofilament formation and rupture in NiO resistive switching memories [J].
Ielmini, D. ;
Nardi, F. ;
Cagli, C. .
NANOTECHNOLOGY, 2011, 22 (25)
[6]   Nanoscale Memristor Device as Synapse in Neuromorphic Systems [J].
Jo, Sung Hyun ;
Chang, Ting ;
Ebong, Idongesit ;
Bhadviya, Bhavitavya B. ;
Mazumder, Pinaki ;
Lu, Wei .
NANO LETTERS, 2010, 10 (04) :1297-1301
[7]   Electrical observations of filamentary conductions for the resistive memory switching in NiO films [J].
Kim, D. C. ;
Seo, S. ;
Ahn, S. E. ;
Suh, D. -S. ;
Lee, M. J. ;
Park, B. -H. ;
Yoo, I. K. ;
Baek, I. G. ;
Kim, H. -J. ;
Yim, E. K. ;
Lee, J. E. ;
Park, S. O. ;
Kim, H. S. ;
Chung, U-In ;
Moon, J. T. ;
Ryu, B. I. .
APPLIED PHYSICS LETTERS, 2006, 88 (20)
[8]   Nanofilamentary resistive switching in binary oxide system; a review on the present status and outlook [J].
Kim, Kyung Min ;
Jeong, Doo Seok ;
Hwang, Cheol Seong .
NANOTECHNOLOGY, 2011, 22 (25)
[9]   Collective Motion of Conducting Filaments in Pt/n-Type TiO2/p-Type NiO/Pt Stacked Resistance Switching Memory [J].
Kim, Kyung Min ;
Song, Seul Ji ;
Kim, Gun Hwan ;
Seok, Jun Yeong ;
Lee, Min Hwan ;
Yoon, Jung Ho ;
Park, Jucheol ;
Hwang, Cheol Seong .
ADVANCED FUNCTIONAL MATERIALS, 2011, 21 (09) :1587-1592
[10]   MOLECULAR ADSORPTION ON OXIDE SURFACES - ELECTRONIC-STRUCTURE AND ORIENTATION OF NO ON NIO(100)/NI(100) AND ON NIO(100) AS DETERMINED FROM ELECTRON SPECTROSCOPIES AND ABINITIO CLUSTER CALCULATIONS [J].
KUHLENBECK, H ;
ODORFER, G ;
JAEGER, R ;
ILLING, G ;
MENGES, M ;
MULL, T ;
FREUND, HJ ;
POHLCHEN, M ;
STAEMMLER, V ;
WITZEL, S ;
SCHARFSCHWERDT, C ;
WENNEMANN, K ;
LIEDTKE, T ;
NEUMANN, M .
PHYSICAL REVIEW B, 1991, 43 (03) :1969-1989