Effect of growth rate on the nucleation of α-Fe2O3 on α-Al2O3(0001) by oxygen-plasma-assisted molecular beam epitaxy

被引：9

作者：

Yi, SI ^{[1
]}

Liang, Y ^{[1
]}

Chambers, SA ^{[1
]}

机构：

[1] Pacific NW Natl Lab, Environm Mol Sci Lab, Richland, WA 99325 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1999年 / 17卷 / 04期

关键词：

D O I：

10.1116/1.581883

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have investigated the role of growth rate on the nucleation of epitaxial alpha-Fe2O3 on alpha-Al2O3(0001). We show that a slow growth rate (similar to 1-2 Angstrom/min) must be employed during growth of the first 30 Angstrom in order to form relaxed, three-dimensional islands. A higher growth rate (similar to 0.1-0.3 Angstrom/s) can then be used. Island coalescence occurs, resulting in a laminar surface for film thicknesses as low as a few hundred Angstrom. If a higher initial growth rate is used, three-dimensional island growth is kinetically impeded, and film relaxation occurs by misfit dislocation generation. The film surface then roughens on a more macroscopic length scale, giving rise to a poor quality surface; (C) 1999 American Vacuum Society. [S0734-2101(99)20604-5].

引用

页码：1737 / 1742

页数：6

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