End-bonded contacts for carbon nanotube transistors with low, size-independent resistance

被引:181
作者
Cao, Qing [1 ]
Han, Shu-Jen [1 ]
Tersoff, Jerry [1 ]
Franklin, Aaron D. [1 ]
Zhu, Yu [1 ]
Zhang, Zhen [1 ]
Tulevski, George S. [1 ]
Tang, Jianshi [1 ]
Haensch, Wilfried [1 ]
机构
[1] IBM Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
HIGH-PERFORMANCE ELECTRONICS; FIELD-EFFECT TRANSISTORS; METAL-GRAPHENE; NANOCONTACTS; CIRCUITS; GATE;
D O I
10.1126/science.aac8006
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Moving beyond the limits of silicon transistors requires both a high-performance channel and high-quality electrical contacts. Carbon nanotubes provide high-performance channels below 10 nanometers, but as with silicon, the increase in contact resistance with decreasing size becomes a major performance roadblock. We report a single-walled carbon nanotube (SWNT) transistor technology with an end-bonded contact scheme that leads to size-independent contact resistance to overcome the scaling limits of conventional side-bonded or planar contact schemes. A high-performance SWNT transistor was fabricated with a sub-10-nanometer contact length, showing a device resistance below 36 kilohms and on-current above 15 microampere per tube. The p-type end-bonded contact, formed through the reaction of molybdenum with the SWNT to form carbide, also exhibited no Schottky barrier. This strategy promises high-performance SWNT transistors, enabling future ultimately scaled device technologies.
引用
收藏
页码:68 / 72
页数:5
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