Electrostatically actuated micromirror devices in silicon technology

被引：16

作者：

Lang, W ^{[1
]}

Pavlicek, H ^{[1
]}

Marx, T ^{[1
]}

Scheithauer, H ^{[1
]}

Schmidt, B ^{[1
]}

机构：

[1] Hahn Schickard Gesell, Inst Mikro & Informat Tech, D-78052 Villagen, Germany

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1999年 / 74卷 / 1-3期

关键词：

micromirror; silicon; dry etching;

D O I：

10.1016/S0924-4247(98)00321-5

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Micromirrors with a size of 1 to 3 mm for laser beam deflection are described. The mirrors are fabricated from single crystalline silicon using bulk micromachining, dry etching and anodic bonding and are actuated electrostatically. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：216 / 218

页数：3