Band gap narrowing in n-type and p-type 3C-, 2H-, 4H-, 6H-SiC, and Si

被引:80
|
作者
Persson, C [1 ]
Lindefelt, U
Sernelius, BE
机构
[1] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
[2] ABB Corp Res, S-72178 Vasteras, Sweden
关键词
D O I
10.1063/1.371380
中图分类号
O59 [应用物理学];
学科分类号
摘要
Doping-induced energy shifts of the conduction band minimum and the valence band maximum have been calculated for n-type and p-type 3C-, 2H-, 4H-, 6H-SiC, and Si. The narrowing of the fundamental band gap and of the optical band gap are presented as functions of ionized impurity concentration. The calculations go beyond the common parabolic treatments of the ground state energy dispersion by using energy dispersion and overlap integrals from band structure calculations. The nonparabolic valence band curvatures influence strongly the energy shifts especially in p-type materials. The utilized method is based on a zero-temperature Green's function formalism within the random phase approximation with local field correction according to Hubbard. We have parametrized the shifts of the conduction and the valence bands and made comparisons with recently published results from a semi-empirical model. (C) 1999 American Institute of Physics. [S0021-8979(99)09020-9].
引用
收藏
页码:4419 / 4427
页数:9
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