Lateral shearing interferometer for measuring photoinduced refractive index change in As2S3

被引：2

作者：

Krishnaswami, Kannan ^{[1
]}

Bernacki, Bruce E. ^{[1
]}

Ho, Nicolas ^{[1
]}

Allen, Paul J. ^{[1
]}

Anheier, Norman C. ^{[1
]}

机构：

[1] Pacific NW Natl Lab, Richland, WA 99352 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2008年 / 79卷 / 09期

关键词：

D O I：

10.1063/1.2973640

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We have built and demonstrated a lateral shearing interferometer as a process engineering and control tool for the fabrication and characterization of direct-laser-written waveguide structures in chalcogenide glasses. Photoinduced change in refractive index of 0.154 +/- 0.002 was measured for as-deposited amorphous As(2)S(3) thin films at 633 nm with an estimated measurement uncertainty of 1.3% for this air-gap interferometer configuration. The simple design of this interferometer can easily be adapted to other wavelengths including mid-and long-wave infrared regions to measure changes in refractive index or material inhomogeneities in transmissive materials. (C) 2008 American Institute of Physics. [DOI: 10.1063/1.2973640]

引用

页数：5

共 24 条

[1] A WAVEFRONT SHEARING INTERFEROMETER [J].