Effects of the V/III ratio on the quality of aluminum nitride grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

被引：12

作者：

Coudurier, N. ^{[1
,2
]}

Boichot, R. ^{[1
]}

Fellmann, V. ^{[2
]}

Claudel, A. ^{[2
]}

Blanquet, E. ^{[1
]}

Crisci, A. ^{[1
,3
]}

Coindeau, S. ^{[1
,3
]}

Pique, D. ^{[2
]}

Pons, M. ^{[1
]}

机构：

[1] Grenoble INP CNRS UJF, BP 75, F-38402 St Martin Dheres, France

[2] ACERDE, F-73800 St Martin Dheres, France

[3] Grenoble INP CNRS, CMTC, F-38402 St Martin Dheres, France

来源：

PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 10, NO 3 | 2013年 / 10卷 / 03期

关键词：

aluminum nitride; hydride vapor phase epitaxy; chemical vapour deposition; protective layer; semiconducting aluminum compounds; ALN LAYERS; POLAR;

D O I：

10.1002/pssc.201200686

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A High Temperature Hydride Vapor Phase Epitaxy reactor (HT-HVPE) was used to grow 5 mu m-thick (0001) epitaxial AlN layers on sapphire. The experimental set-up consists of a vertical cold-wall quartz reactor working at low pressure in which the reactions take place on a graphite susceptor heated by induction. The reactants used are ammonia (NH3) and aluminum chlorides (AlClx) in situ formed via chlorine (Cl-2) reaction with high purity aluminum pellets. As-grown AlN layers have been characterized by Scanning Electron Microscopy (SEM), Xray diffraction rocking curves (XRC) and Raman spectroscopy. First, the influence of the V/III ratio in the gas phase on surface morphology, crystalline quality and strain into the material is investigated in order to improve the quality of epitaxial AlN layers grown at high temperature. Parameters were adjusted to keep constant growth rate of about 5 mu m/h. Second, a protective layer (growth of a 200 nm-thick AlN layer at 1200 degrees C) was deposited before the main growth of a 5 mu m layer of AlN at 1500 degrees C. A 430 arcsec FWHM value for the 0002 reflection of the AlN layer has been obtained for such experimental conditions. (C) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

引用

页码：362 / 365

页数：4

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