Interaction of a polyglycidol-based nonionic surfactant with silicon in hydrofluoric acid solutions

被引：3

作者：

Haworth, PD ^{[1
]}

Kovach, MJ

Sperline, RP

Raghavan, S

机构：

[1] Univ Arizona, Dept Mat Sci & Engn, Tucson, AZ 85721 USA

[2] Univ Arizona, Dept Chem, Tucson, AZ 85721 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1999年 / 146卷 / 06期

关键词：

D O I：

10.1149/1.1391928

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The interaction of an alkyl polyglycidol surfactant with hydrogen-passivated silicon from dilute hydrofluoric acid solutions has been measured using wettability and attenuated total reflection Fourier transform infrared spectroscopic techniques. The surfactant was found to be very effective in rendering hydrophobic hydrogen-terminated silicon hydrophilic in the hydrofluoric acid solutions. The adsorption of the surfactant, and its desorption when rinsed with deionized water, were very rapid. However, approximately 20% of the adsorbed surfactant remained on the silicon surface even after prolonged rinsing. (C) 1999 The Electrochemical Society. S0013-4651(98)08-001-X. All rights reserved.

引用

页码：2284 / 2288

页数：5

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