Interaction of a polyglycidol-based nonionic surfactant with silicon in hydrofluoric acid solutions

被引：3

作者：

Haworth, PD ^{[1
]}

Kovach, MJ

Sperline, RP

Raghavan, S

机构：

[1] Univ Arizona, Dept Mat Sci & Engn, Tucson, AZ 85721 USA

[2] Univ Arizona, Dept Chem, Tucson, AZ 85721 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1999年 / 146卷 / 06期

关键词：

D O I：

10.1149/1.1391928

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The interaction of an alkyl polyglycidol surfactant with hydrogen-passivated silicon from dilute hydrofluoric acid solutions has been measured using wettability and attenuated total reflection Fourier transform infrared spectroscopic techniques. The surfactant was found to be very effective in rendering hydrophobic hydrogen-terminated silicon hydrophilic in the hydrofluoric acid solutions. The adsorption of the surfactant, and its desorption when rinsed with deionized water, were very rapid. However, approximately 20% of the adsorbed surfactant remained on the silicon surface even after prolonged rinsing. (C) 1999 The Electrochemical Society. S0013-4651(98)08-001-X. All rights reserved.

引用

页码：2284 / 2288

页数：5

共 50 条

[21] Nanoporous silicon fabricated by a novel method with cation complexes in hydrofluoric acid solutions [J].

Matsuura, T ;

Liu, XW ;

Braithwaite, NS .

MICROSCOPY OF SEMICONDUCTING MATERIALS 2003, 2003, (180) :437-440

[22] Electopolishing of p-type silicon thin films in hydrofluoric acid solutions [J].

Hu, Fei ;

Chen, Yu Wei ;

Wang, Xiao Dan ;

Li, Xiao Hong .

ADVANCED DESIGN TECHNOLOGY, PTS 1-3, 2011, 308-310 :1080-1083

[23] Synthesis and wettability of cellulose based composites by aqueous solutions of nonionic surfactant [J].

Szymczyk, Katarzyna ;

Podkoscielna, Beata .

COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, 2021, 623

[24] Study on the interaction between nonionic sugar-based surfactant and DNA [J].

Jing, DW ;

Zhang, J ;

Zhang, GY .

ACTA CHIMICA SINICA, 2004, 62 (06) :561-566

[25] The interaction between dodecyl polyoxyethylene polyoxypropylene ether nonionic surfactant and polyvinylpyrrolidone in aqueous solutions [J].

Mu, JH ;

Li, GZ ;

Wang, ZW ;

Zheng, LQ .

JOURNAL OF DISPERSION SCIENCE AND TECHNOLOGY, 2000, 21 (07) :999-1005

[26] Membrane based system for ultrapure hydrofluoric acid etching solutions [J].

Mukherjee, D ;

Kulkarni, A ;

Gill, WN .

JOURNAL OF MEMBRANE SCIENCE, 1996, 109 (02) :205-217

[27] Effect of amino-acid-based polar oils on the Krafft temperature and solubilization in ionic and nonionic surfactant solutions [J].

Kunieda, H ;

Matsuzawa, K ;

Makhkamov, R ;

Horii, M ;

Yamashita, Y ;

Yumioka, R ;

Koyama, M ;

Sakamotol, K .

JOURNAL OF DISPERSION SCIENCE AND TECHNOLOGY, 2003, 24 (06) :767-772

[28] ULTRAHIGH-VACUUM SURFACE-ANALYSIS OF SILICON (100) TREATED IN AQUEOUS HYDROFLUORIC-ACID AND BUFFERED HYDROFLUORIC-ACID SOLUTIONS [J].

SAUER, DE ;

STUVE, EM .

APPLIED SURFACE SCIENCE, 1994, 78 (01) :47-55

[29] Drag reduction and degradation of nonionic surfactant solutions with organic acid in turbulent pipe flow [J].

Tamano, Shinji ;

Ikarashi, Hiroki ;

Morinishi, Yohei ;

Taga, Keijiro .

JOURNAL OF NON-NEWTONIAN FLUID MECHANICS, 2015, 215 :1-7

[30] Masking effect of copper during anisotropic etching of silicon in buffered hydrofluoric acid solutions [J].

Li, GM ;

Jiao, J ;

Seraphin, S ;

Raghavan, S ;

Jeon, JS .

JOURNAL OF APPLIED PHYSICS, 1999, 85 (03) :1857-1863

← 1 2 3 4 5 →