Growth of epitaxial pyrite (FeS2) thin films using sequential evaporation

被引:7
作者
Vahidi, M. [1 ]
Lehner, S. W. [2 ,3 ]
Buseck, P. R. [2 ,3 ]
Newman, N. [1 ]
机构
[1] Arizona State Univ, Sch Engn Matter Transport & Energy, Tempe, AZ 85287 USA
[2] Arizona State Univ, Dept Chem & Biochem, Tempe, AZ 85287 USA
[3] Arizona State Univ, Sch Earth & Space Explorat, Tempe, AZ 85287 USA
基金
美国国家科学基金会;
关键词
Pyrite; Layer-by-layer growth; Epitaxy; Thermochemistry; Thin films;
D O I
10.1016/j.actamat.2013.08.045
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Pyrite (FeS2), a semiconductor composed of inexpensive, non-toxic elements, has a band gap of similar to 0.95 eV and an absorption coefficient higher than conventional direct band gap semiconductors, including GaAs. These facts have inspired the use of pyrite as a potential candidate for terawatt-scale photovoltaic systems. However, there has been limited progress synthesizing thin films of sufficient quality to produce efficient solar cells. Here we describe the layer-by-layer growth of stoichiometric, single-phase pyrite thin films on heated substrates using sequential evaporation of Fe under high vacuum followed by sulfidation at pressures ranging from 1 mTorr to 1 Torr. High-resolution transmission electron microscopy reveals high-quality, defect-free pyrite grains. We demonstrate that epitaxial pyrite layers can be deposited with this method on natural pyrite substrates. (C) 2013 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:7392 / 7398
页数:7
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