Ion selectivity during formation of passive films on stainless steels and alloys

被引:2
作者
Qiu, JH [1 ]
机构
[1] Nanyang Technol Univ, Sch Mat Engn, Singapore 639798, Singapore
来源
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2002年 / 16卷 / 1-2期
关键词
D O I
10.1142/S0217979202009500
中图分类号
O59 [应用物理学];
学科分类号
摘要
The stability of stainless steels and allied materials is essentially determined by the integrity of naturally formed ultra thin oxide films - the passive films on their surfaces. The thickness of such an ultra thin film for a typical stainless steel (AISI 304) is about 2 run. The compositions of passive films are totally different from those of the underlying substrates. During the film formation process, ion selectivity occurs both at the solid/liquid and metal/oxide interfaces. Using advanced surface and solution analytical techniques such as X-ray Photoelectron Spectroscopy (XPS) and Inductively-Coupled Plasma source Mass Spectroscopy (ICP-MS), it is possible analyse the ion selectivity at the solid/liquid and metal/oxide interfaces. It was observed that at the solid/liquid interface, elements such as iron and nickel were selectively leached into the liquid phase, leading to a surface enriched with other alloying elements such as chromium and molybdenum. There exists a good linear relationship between die selectivity factor and passivation time.
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页码:93 / 99
页数:7
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