Effects of temperature and Mo2C layer on stress and structural properties in CVD diamond film grown on Mo foil

被引:17
作者
Long, Fen [1 ,2 ]
Wei, Qiuping [1 ,3 ]
Yu, Z. M. [1 ,2 ]
Luo, Jiaqi [1 ]
Zhang, Xiongwei [1 ]
Long, Hangyu [1 ]
Wu, Xianzhe [2 ]
机构
[1] Cent S Univ, Sch Mat Sci & Engn, Changsha 410083, Hunan, Peoples R China
[2] Cent S Univ, State Key Lab Powder Met, Changsha 410083, Hunan, Peoples R China
[3] Cent S Univ, Sch Met Sci & Engn, Changsha 410083, Hunan, Peoples R China
基金
中国博士后科学基金;
关键词
Stress; Mo2C interlayer; CVD diamond film; Foil substrate; Temperature; CHEMICAL-VAPOR-DEPOSITION; MICRO-RAMAN SPECTROSCOPY; X-RAY-DIFFRACTION; RESIDUAL-STRESS; THIN-FILMS; NANOCRYSTALLINE DIAMOND; THERMAL-EXPANSION; AMORPHOUS-CARBON; SUBSTRATE; TENSILE;
D O I
10.1016/j.jallcom.2013.06.146
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Polycrystalline diamond films have been prepared by hot-filament-assisted chemical vapor deposition (HFCVD) on Mo foils. The morphology, growth rate, phase composition, element distribution and residual stress of the films at different temperature were investigated by field-emission scanning electron microscopy, Raman spectrum, field emission electron probe microanalysis and X-ray diffraction. Results show that the residual stress of the diamond films is compressive. The thermal stress plays a decisive role in the total stress, while the intrinsic stress can change the trend of the total stress. The residual stress of substrate gradually changes from tensile stress to compressive stress with the increase of the deposited temperature. A Mo2C interlayer is formed during deposition process, and this layer has an important influence on the stresses of films and substrates. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:638 / 645
页数:8
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