Organic materials challenges for 193 nm imaging

被引：83
作者：
Reichmanis, E [1 ]
Nalamasu, O [1 ]
Houlihan, FM [1 ]
机构：
[1] AT&T Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
来源：
ACCOUNTS OF CHEMICAL RESEARCH | 1999年 / 32卷 / 08期
关键词：
D O I：
10.1021/ar970150n
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
[No abstract available]
引用
收藏
页码：659 / 667
页数：9
相关论文
共 50 条
[1]  
Allen R. D., 1995, J PHOTOPOLYM SCI TEC, V8, P623
[2]  
ALLEN RD, 1995, P SOC PHOTO-OPT INS, V2438, P474, DOI 10.1117/12.210396
[3]  
ALLEN RD, 1997, J PHOTOPOLYM SCI TEC, V10, P503, DOI DOI 10.2494/PHOTOPOLYMER.10.503
[4]  
ASAKAWA K, 1995, P SOC PHOTO-OPT INS, V2438, P563, DOI 10.1117/12.210361
[5]   THE TRANSISTOR, A SEMI-CONDUCTOR TRIODE [J].
BARDEEN, J ;
BRATTAIN, WH .
PHYSICAL REVIEW, 1948, 74 (02) :230-231
[6]   POLYVINYL ARENE SULFONES) AS NOVEL POSITIVE PHOTORESISTS [J].
BOWDEN, MJ ;
CHANDROSS, EA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (10) :1370-1374
[7]   CYCLOOLEFIN COPOLYMERS - A NEW CLASS OF TRANSPARENT THERMOPLASTIC POLYMERS [J].
CHERDRON, H ;
BREKNER, MJ ;
OSAN, F .
ANGEWANDTE MAKROMOLEKULARE CHEMIE, 1994, 223 :121-133
[8]   DEEP-UV CHEMICALLY AMPLIFIED DISSOLUTION-INHIBITED PHOTORESISTS [J].
CRIVELLO, JV ;
SHIM, SY ;
SMITH, BW .
CHEMISTRY OF MATERIALS, 1994, 6 (11) :2167-2171
[9]   Chemically amplified electron-beam photoresists [J].
Crivello, JV ;
Shim, SY .
CHEMISTRY OF MATERIALS, 1996, 8 (02) :376-381
[10]  
Dammel R., 1993, DIAZONAPHTHOQUINONE, P70
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