Quantification of Bulk Densification in Fused Silica Induced by Femtosecond Laser Exposure in the Sub-50 fs Regime

被引：0

作者：

McMillen, Ben ^{[1
]}

Bellouard, Yves ^{[1
]}

Uteza, Olivier ^{[2
]}

Clady, Raphaeel ^{[2
]}

Sentis, Marc ^{[2
]}

机构：

[1] Ecole Polytech Fed Lausanne, STI IMT, Galatea Lab, Rue La Maladiere 71b, CH-2002 Neuchatel, Switzerland

[2] Aix Marseille Univ, CNRS, UMR 7341, LP3, Case 917,163 Ave Luminy, F-13288 Marseille 09, France

来源：

2016 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2016年

关键词：

PULSES;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Using micro-cantilever deflection, we study laser-induced densification in bulk fused silica in the sub-50 fs, non-ablative regime. We estimate induced densification from deflection measurements, with a maximum value of 0.014%.

引用

页数：2

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