Thermal annealing and density fluctuations in silica glass

被引:33
作者
Le Parc, R
Champagnon, B
Guenot, P
Dubois, S
机构
[1] Univ Lyon 1, CNRS, UMR 5620, Lab Physicochim Mat Luminescents, F-69622 Villeurbanne, France
[2] Alcatel, R&D Fibres Opt, F-78700 Conflans St Honorine, France
关键词
D O I
10.1016/S0022-3093(01)00835-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Silica glasses of a same composition with different annealing times above and below T-g are characterized by infra-red and Raman spectroscopy in order to determine their fictive temperature. The Rayleigh scattering of these different samples is shown to decrease when the fictive temperature decreases in agreement with a decrease of density fluctuations. Some quantitative discrepancies are however shown to occur for long annealing at 950 degreesC. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:366 / 369
页数:4
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