Electron emission Si-based resonant-tunneling diode

被引:0
作者
Evtukh, A. [1 ]
Goncharuk, N. [2 ]
Litovchenko, V. [1 ]
Mimura, H. [3 ]
机构
[1] V Lashkaryov Inst Semicond Phys, UA-03028 Kiev, Ukraine
[2] Res Inst Orion, UK-03057 Kiev, Ukraine
[3] Univ Shizuoka, Res Inst Elect, Hamamatsu, Shizuoka, Japan
来源
2011 24TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) | 2011年
关键词
electron field emission; resonant-tunneling; quantum well; silicon; silicon oxide; high frequency;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
New type of field emission resonant tunneling diode has been proposed and investigated as theoretically and experimentally. It based on Si-SiOx-Si multilayer cathode containing SiOx layer as input potential barrier, Si layer as quantum well and vacuum layer as output potential barrier of double barrier quantum structure. The calculation predicted the existence of the resonant maxima (three or four in dependence of input barrier height) on the current density - electric field dependences. Frequency dependences pointed out on appearance of negative conductance resulted from resonant tunnelling through the second energy level in QW at a series of transit angle (theta(up)) values. The maximal values of optimal and upper frequency about 1.5 THz and 2 THz are reached at theta(up) close to 0.45 pi when resonant tunnelling occurs through the third resonant level in QW. Experimental results confirmed the existence of the resonance peak in investigated resonant-tunnelling structure.
引用
收藏
页码:85 / +
页数:2
相关论文
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