Estimation of low-dose-rate degradation on bipolar linear integrated circuits using switching experiments

被引:36
作者
Boch, J [1 ]
Saigné, F
Schrimpf, RD
Vaillé, JR
Dusseau, L
Ducret, S
Bernard, M
Lorfèvre, E
Chatry, C
机构
[1] Univ Montpellier 2, CEM2, F-34095 Montpellier 5, France
[2] Ctr Natl Etud Spatiales, F-31055 Toulouse, France
[3] Vanderbilt Univ, Nashville, TN 37235 USA
[4] TRAD, F-31319 Labege, France
关键词
bipolar technology; dose rate; enhanced low-dose-rate sensitivity (ELDRS); integrated circuit; switching experiment; total dose; IONIZING-RADIATION;
D O I
10.1109/TNS.2005.860711
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The low-dose-rate response of five bipolar integrated circuits is evaluated on the basis of switching experiments. Such experiments consist of performing first a high-dose-rate irradiation followed by a low-dose-rate irradiation. Based on these experiments, a time-saving method to predict the low-dose-rate degradation of bipolar linear microcircuits is proposed. This approach provides a good estimate of the low-dose-rate degradation.
引用
收藏
页码:2616 / 2621
页数:6
相关论文
共 8 条
[1]   Origins of total-dose response variability in linear bipolar microcircuits [J].
Barnaby, HJ ;
Cirba, CR ;
Schrimpf, RD ;
Fleetwood, DM ;
Pease, RL ;
Shaneyfelt, MR ;
Turflinger, T ;
Krieg, JF ;
Maher, MC .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2000, 47 (06) :2342-2349
[2]   Identification of degradation mechanisms in a bipolar linear voltage comparator through correlation of transistor and circuit response [J].
Barnaby, HJ ;
Schrimpf, RD ;
Pease, RL ;
Cole, P ;
Turflinger, T ;
Krieg, J ;
Titus, J ;
Emily, D ;
Gehlhausen, M ;
Witczak, SC ;
Maher, MC ;
Van Nort, D .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1999, 46 (06) :1666-1673
[3]   Total dose effects on bipolar integrated circuits:: Characterization of the saturation region [J].
Boch, J ;
Saigné, F ;
Ducret, S ;
Schrimpf, RD ;
Fleetwood, DM ;
Iacconi, P ;
Dusseau, L .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2004, 51 (06) :3225-3230
[4]   Effect of switching from high to low dose rate on linear bipolar technology radiation response [J].
Boch, J ;
Saigné, F ;
Schrimpf, RD ;
Fleetwood, DM ;
Ducret, S ;
Dusseau, L ;
David, JP ;
Fesquet, J ;
Gasiot, J ;
Ecoffet, R .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2004, 51 (05) :2896-2902
[5]   Effect of thermal annealing on radiation-induced degradation of bipolar technologies when the dose rate is switched from high to low [J].
Ducret, S ;
Saigné, F ;
Boch, J ;
Schrimpf, RD ;
Fleetwood, DA ;
Vaille, JR ;
Dusseau, L ;
David, JP ;
Ecoffet, R .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2004, 51 (06) :3219-3224
[6]   RESPONSE OF ADVANCED BIPOLAR PROCESSES TO IONIZING-RADIATION [J].
ENLOW, EW ;
PEASE, RL ;
COMBS, W ;
SCHRIMPF, RD ;
NOWLIN, RN .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1991, 38 (06) :1342-1351
[7]   HARDNESS ASSURANCE CONSIDERATIONS FOR LONG-TERM IONIZING-RADIATION EFFECTS ON BIPOLAR STRUCTURES [J].
HART, AR ;
SMYTH, JB ;
VANLINT, VAJ ;
SNOWDEN, DP ;
LEADON, RE .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1978, 25 (06) :1502-1507
[8]   Enhanced damage in linear bipolar integrated circuits at low dose rate [J].
Johnston, AH ;
Rax, BG ;
Lee, CI .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1995, 42 (06) :1650-1659