Nanometer focusing of hard x rays by phase zone plates

被引：203
作者：
Yun, W
Lai, B
Cai, Z
Maser, J
Legnini, D
Gluskin, E
Chen, Z
Krasnoperova, AA
Vladimirsky, Y
Cerrina, F
Di Fabrizio, E
Gentili, M
机构：
[1] Argonne Natl Lab, Expt Facil Div, Argonne, IL 60439 USA
[2] Univ Wisconsin, Dept Elect & Comp Engn, Ctr Xray Lithog, Madison, WI 53706 USA
[3] CNR, Ist Elettron Stato Solido, I-00156 Rome, Italy
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1999年 / 70卷 / 05期
关键词：
D O I：
10.1063/1.1149744
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Focusing of 8 keV x rays to a spot size of 150 and 90 nm full width at half maximum have been demonstrated at the first- and third-order foci, respectively, of a phase zone plate (PZP). The PZP has a numerical aperture of 1.5 mrad and focusing efficiency of 13% for 8 keV x rays. A flux density gain of 121 000 was obtained at the first-order focus. In this article, the fabrication of the PZP and its experimental characterization are presented and some special applications are discussed. (C) 1999 American Institute of Physics. [S0034-6748(99)02705-7].
引用
收藏
页码：2238 / 2241
页数：4
相关论文
共 17 条
  • [1] ANDERSON EH, 1995, J VAC SCI TECHNOL B, V13, P2525
  • [2] TRANSMISSION GRATINGS THAT DIFFRACT 8-KEV X-RAYS
    BIONTA, RM
    [J]. APPLIED PHYSICS LETTERS, 1987, 51 (10) : 725 - 727
  • [3] Charalambous P, 1995, PROC SPIE, V2516, P2, DOI 10.1117/12.221663
  • [4] CHEN ZG, 1998, THESIS U WISCONSIN M
  • [5] Low-distortion electron-beam lithography for fabrication of high-resolution germanium and tantalum zone plates
    David, C
    Kaulich, B
    Medenwaldt, R
    Hettwer, M
    Fay, N
    Diehl, M
    Thieme, J
    Schmahl, G
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2762 - 2766
  • [6] Fabrication of a hard x-ray sputtered-sliced Fresnel phase zone plate
    Kamijo, N
    Tamura, S
    Suzuki, Y
    Handa, K
    Takeuchi, A
    Yamamoto, S
    Ando, M
    Ohsumi, K
    Kihara, H
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1997, 68 (01) : 14 - 16
  • [7] KAULICH B, 1998, SPIES 43 ANN M SAN D
  • [8] PHASE ZONE PLATES FOR X-RAYS AND EXTREME UV
    KIRZ, J
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1974, 64 (03) : 301 - 309
  • [9] HARD X-RAY PHASE ZONE PLATE FABRICATED BY LITHOGRAPHIC TECHNIQUES
    LAI, B
    YUN, WB
    LEGNINI, D
    XIAO, Y
    CHRZAS, J
    VICCARO, PJ
    WHITE, V
    BAJIKAR, S
    DENTON, D
    CERRINA, F
    DIFABRIZIO, E
    GENTILI, M
    GRELLA, L
    BACIOCCHI, M
    [J]. APPLIED PHYSICS LETTERS, 1992, 61 (16) : 1877 - 1879
  • [10] LAI B, IN PRESS
12