Heterogeneous integration based on low-temperature bonding for advanced optoelectronic devices

被引:12
作者
Higurashi, Eiji [1 ,2 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Res Ctr Ubiquitous MEMS & Micro Engn UMEMSME, Tsukuba, Ibaraki 3058564, Japan
[2] Univ Tokyo, Sch Engn, Bunkyo Ku, Tokyo 1138656, Japan
关键词
ROOM-TEMPERATURE; LITHIUM-NIOBATE; SOLDER; GE; ACTIVATION; SI;
D O I
10.7567/JJAP.57.04FA02
中图分类号
O59 [应用物理学];
学科分类号
摘要
Heterogeneous integration is an attractive approach to manufacturing future optoelectronic devices. Recent progress in low-temperature bonding techniques such as plasma activation bonding (PAB) and surface-activated bonding (SAB) enables a new approach to integrating dissimilar materials for a wide range of photonics applications. In this paper, low-temperature direct bonding and intermediate layer bonding techniques are focused, and their state-of-the-art applications in optoelectronic devices are reviewed. First, we describe the room-temperature direct bonding of Ge/Ge and Ge/Si wafers for photodetectors and of GaAs/SiC wafers for high-power semiconductor lasers. Then, we describe low-temperature intermediate layer bonding using Au and lead-free Sn-3.0Ag-0.5Cu solders for optical sensors and MEMS packaging. (C) 2018 The Japan Society of Applied Physics.
引用
收藏
页数:6
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