Optical and structural properties of InGaN/GaN multiple quantum well structure grown by metalorganic chemical vapor deposition

被引:30
作者
Chen, JH
Feng, ZC [1 ]
Tsai, HL
Yang, JR
Li, P
Wetzel, C
Detchprohm, T
Nelson, J
机构
[1] Natl Taiwan Univ, Grad Inst Electroopt Engn, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan
[3] Natl Taiwan Univ, Dept Mat Sci & Engn, Taipei 10617, Taiwan
[4] Uniroyal Optoelect, Tampa, FL 33619 USA
关键词
HR-XRD; high-resolution X-ray diffraction; HR-TEM; high-resolution transmission electron microscopy; PLE; photoluminescence excitation; MQW; multiple quantum well; MOCVD; metalorganic chemical vapor deposition;
D O I
10.1016/j.tsf.2005.07.241
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
InGaN/GaN multiple quantum well light emitting diode structures have been grown on sapphire substrates by metalorganic chemical vapor deposition. They are investigated, in this study, by high-resolution X-ray diffraction, high-resolution transmission electron microscopy, photoluminescence, and photoluminescence excitation. HR-XRD showed multiple satellite peaks up to 10th order due to the quantum well superlattice confinement effects. These indicate the high quality of layer interface structures of this sample. Excitation power-dependent photoluminescence shows that both piezoelectric field-induced quantum-confined Stark effect and band filling effect influence the luminescent properties of this sample. Temperature-dependent photoluminescence of this sample has also been studied. The peak position of the PL exhibits a monotonic red-shift and the full width at half maximum of the PL band shows a W-shaped temperature-dependent behavior with increasing temperature. From the photoluminescence excitation results, a large energy difference, so-called Stokes shift, between the band-edge absorption and emission was observed. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:123 / 127
页数:5
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