Interband Effects on Hot Carrier Relaxation in Titanium Nitride Films

被引：0
|
作者：
Ferguson, H. [1 ]
Guler, U. [2 ]
Kinsey, N. [2 ,3 ,4 ]
Shalacv, V. M. [2 ]
Norris, T. [1 ]
Boltasseva, A. [2 ]
机构：
[1] Univ Michigan, Elect Engn, Ann Arbor, MI 48109 USA
[2] Virginia Commonwealth Univ, Elect & Comp Engn, Med Coll Virginia Campus, Richmond, VA 23284 USA
[3] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
[4] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
来源：
2017 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2017年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Hot carrier cooling rates were measured using transmission pump-probe on 30nm TiN films. Experiments used a 400nm pump/800nm probe and a 650nm pump/800nm probe. The bandstructure gives insight into the long cooling times observed.
引用
收藏
页数：2
相关论文
共 50 条
  • [41] HOT CARRIER RELAXATION AND EXCITON SCREENING IN CUCL
    ANTONETTI, A
    HULIN, D
    MIGUS, A
    MYSYROWICZ, A
    CHASE, LL
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1985, 2 (07) : 1197 - 1203
  • [42] MICROSTRUCTURE OF IRON NITRIDE TITANIUM NITRIDE FILMS PREPARED BY CVD
    FUNAKUBO, H
    KIEDA, N
    SHINOZAKI, K
    MIZUTANI, N
    NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1993, 101 (07): : 733 - 736
  • [43] Hot carrier dynamics of photoinjected plasma in indium nitride
    Rodrigues, Cloves G.
    EUROPEAN PHYSICAL JOURNAL B, 2021, 94 (04):
  • [44] Hot carrier dynamics of photoinjected plasma in indium nitride
    Clóves G. Rodrigues
    The European Physical Journal B, 2021, 94
  • [45] Potential of hafnium nitride for the hot carrier solar cell
    Chung, Simon
    Shrestha, Santosh
    Xia, Hongze
    Gupta, Neeti
    Conibeer, Gavin
    MICRO/NANO MATERIALS, DEVICES, AND SYSTEMS, 2013, 8923
  • [46] TITANIUM NITRIDE FILMS AND THEIR PREPARATION FROM TETRAKIS (DIMETHYLAMIDO)TITANIUM
    KNIZOVA, M
    CHEMICKE LISTY, 1994, 88 (08): : 501 - 507
  • [47] CARRIER ENERGY RELAXATION IN MULTISUBBAND QUANTUM-WELL LASERS WITH HOT PHONON EFFECTS
    TSAI, CY
    EASTMAN, LF
    LO, YH
    TSAI, CY
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (09) : 5334 - 5338
  • [48] Influence of technological parameters on the mechanical properties of titanium nitride films deposited by hot target reactive sputtering
    Kozin, A. A.
    Shapovalov, V. I.
    Smirnov, V. V.
    Useinov, A. S.
    Kravchuk, K. S.
    Gladkikh, E. V.
    Zavyalov, A. V.
    Morozova, A. A.
    24TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY, 2017, 872
  • [49] Stress and strain in titanium nitride thin films
    Machunze, R.
    Janssen, G. C. A. M.
    THIN SOLID FILMS, 2009, 517 (20) : 5888 - 5893
  • [50] ELECTROMIGRATION IN THIN ALUMINUM FILMS ON TITANIUM NITRIDE
    BLECH, IA
    JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) : 1203 - 1208
12345