MODELLING 2DEG CHARGES IN AlGaN/GaN HETEROSTRUCTURES

被引:0
作者
Longobardi, Giorgia [1 ]
Udrea, Florin [1 ]
Sque, Stephen [2 ]
Croon, Jeroen [2 ]
Hurkx, Fred [2 ]
Napoli, Ettore [3 ]
Sonsky, Jan [2 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[2] NXP Semicond, NL-5656 AE Eindhoven, Netherlands
[3] Univ Naples Federico II, DIBET, I-80125 Naples, Italy
来源
2012 INTERNATIONAL SEMICONDUCTOR CONFERENCE (CAS), VOLS 1 AND 2 | 2012年 / 2卷
关键词
PIEZOELECTRIC POLARIZATION;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper we compare different approaches to calculating the charge density in the 2DEG layer of AlGaN/GaN HEMTs. The methods used are (i) analytical theory implemented in MATLAB, (ii) finite-element analysis using semiconductor TCAD software that implements only the Poisson and continuity equations, and (iii) 1D software that solves the Poisson and Schrodinger equations self-consistently. By using the 1D Poisson-Schrodinger solver, we highlight the consequences of neglecting the Schrodinger equation. We conclude that the TCAD simulator predicts with a reasonable level of accuracy the electron density in the 2DEG layer for both a conventional HEMT structure and one featuring an extra GaN cap layer. In addition, while the sheet charge density is not significantly affected by including Schrodinger, its confinement in the channel is found to be modified.
引用
收藏
页码:363 / 366
页数:4
相关论文
共 37 条
  • [31] Mechanism of Ti/Al/Ti/W Au-free ohmic contacts to AlGaN/GaN heterostructures via pre-ohmic recess etching and low temperature annealing
    Zhang, Jinhan
    Huang, Sen
    Bao, Qilong
    Wang, Xinhua
    Wei, Ke
    Zheng, Yingkui
    Li, Yankui
    Zhao, Chao
    Liu, Xinyu
    Zhou, Qi
    Chen, Wanjun
    Zhang, Bo
    APPLIED PHYSICS LETTERS, 2015, 107 (26)
  • [32] Influence of AlGaN n-type doping and AlN thickness on the two-dimensional electron gas density (ns) and resistance (R2DEG)
    Piotrowicz, C.
    Mohamad, B.
    Malbert, N.
    Jaud, M. -A
    Vandendaele, W.
    Charles, M.
    Gwoziecki, R.
    SOLID-STATE ELECTRONICS, 2023, 201
  • [33] Graded Barrier AlGaN/AlN/GaN Heterostructure for Improved 2-Dimensional Electron Gas Carrier Concentration and Mobility
    Das, Palash
    Halder, Nripendra N.
    Kumar, Rahul
    Jana, Sanjay Kr
    Kabi, Sanjib
    Borisov, Boris
    Dabiran, Amir
    Chow, Peter
    Biswas, Dhrubes
    ELECTRONIC MATERIALS LETTERS, 2014, 10 (06) : 1087 - 1092
  • [34] Metalorganic vapor phase epitaxial growth of AlGaN directly on reactive-ion etching-treated GaN surfaces to prepare AIGaN/GaN heterostructures with high electron mobility (∼1500 cm2 V-1 s-1): Impacts of reactive-ion etching-damaged layer removal
    Yamamoto, Akio
    Kanatani, Keito
    Makino, Shinya
    Kuzuhara, Masaaki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (12)
  • [35] Tensile strain and Fermi level alignment in thermally grown TiO2 and Al2O3 based AlGaN/GaN MOS-HEMTs
    Rawat, Akanksha
    Surana, Vivek Kumar
    Ganguly, Swaroop
    Saha, Dipankar
    SOLID-STATE ELECTRONICS, 2020, 164
  • [36] Theoretical Evaluation of the Effects of Isolation-Feature Size and Geometry on the Built-In Strain and 2-D Electron Gas Density of AlGaN/GaN Heterostructure
    Gosselin, Jean-Lou
    Valizadeh, Pouya
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (11) : 4800 - 4806
  • [37] Insight into the suppression mechanism of bulk traps in Al2O3 gate dielectric and its effect on threshold voltage instability in Al2O3/AlGaN/GaN metal-oxide-semiconductor high electron mobility transistors
    Deng, Kexin
    Huang, Sen
    Wang, Xinhua
    Jiang, Qimeng
    Yin, Haibo
    Fan, Jie
    Jing, Guanjun
    Wei, Ke
    Zheng, Yingkui
    Shi, Jingyuan
    Liu, Xinyu
    APPLIED SURFACE SCIENCE, 2023, 638