MODELLING 2DEG CHARGES IN AlGaN/GaN HETEROSTRUCTURES

被引:0
作者
Longobardi, Giorgia [1 ]
Udrea, Florin [1 ]
Sque, Stephen [2 ]
Croon, Jeroen [2 ]
Hurkx, Fred [2 ]
Napoli, Ettore [3 ]
Sonsky, Jan [2 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[2] NXP Semicond, NL-5656 AE Eindhoven, Netherlands
[3] Univ Naples Federico II, DIBET, I-80125 Naples, Italy
来源
2012 INTERNATIONAL SEMICONDUCTOR CONFERENCE (CAS), VOLS 1 AND 2 | 2012年 / 2卷
关键词
PIEZOELECTRIC POLARIZATION;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper we compare different approaches to calculating the charge density in the 2DEG layer of AlGaN/GaN HEMTs. The methods used are (i) analytical theory implemented in MATLAB, (ii) finite-element analysis using semiconductor TCAD software that implements only the Poisson and continuity equations, and (iii) 1D software that solves the Poisson and Schrodinger equations self-consistently. By using the 1D Poisson-Schrodinger solver, we highlight the consequences of neglecting the Schrodinger equation. We conclude that the TCAD simulator predicts with a reasonable level of accuracy the electron density in the 2DEG layer for both a conventional HEMT structure and one featuring an extra GaN cap layer. In addition, while the sheet charge density is not significantly affected by including Schrodinger, its confinement in the channel is found to be modified.
引用
收藏
页码:363 / 366
页数:4
相关论文
共 37 条
  • [21] Modelling of fin width dependent threshold voltage in fin shaped nano channel AlGaN/GaN HEMT
    Chakrabarty, A.
    Swain, R.
    SUPERLATTICES AND MICROSTRUCTURES, 2020, 141
  • [22] Analyses of 2-DEG characteristics in GaN HEMT with AlN/GaN super-lattice as barrier layer grown by MOCVD
    Peiqiang Xu
    Yang Jiang
    Yao Chen
    Ziguang Ma
    Xiaoli Wang
    Zhen Deng
    Yan Li
    Haiqiang Jia
    Wenxin Wang
    Hong Chen
    Nanoscale Research Letters, 7
  • [23] Effect of surface passivation process for AlGaN/GaN HEMT heterostructures using phenol functionalized-porphyrin based organic molecules
    Garg, Manjari
    Naik, Tejas Rajendra
    Pathak, Ravi
    Rao, Valipe Ramgopal
    Liao, Che-Hao
    Li, Kuang-Hui
    Sun, Haiding
    Li, Xiaohang
    Singh, Rajendra
    JOURNAL OF APPLIED PHYSICS, 2018, 124 (19)
  • [24] Analytical Modelling of High Temperature Characteristics on the DC Responses for Schottky-Gate AlGaN/GaN HEMT Devices
    Wang, Yun-Hsiang
    Liang, Yung C.
    Samudra, Ganesh S.
    Chang, Ting-Fu
    Huang, Chih-Fang
    Yuan, Li
    Lo, Guo-Qiang
    2013 IEEE ECCE ASIA DOWNUNDER (ECCE ASIA), 2013, : 379 - 384
  • [25] Buffer Layer Engineering for High (≥1013 cm-2) 2-DEG Density in ZnO-Based Heterostructures
    Khan, Md Arif
    Singh, Rohit
    Mukherjee, Shaibal
    Kranti, Abhinav
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (03) : 1015 - 1019
  • [26] Analytical modeling of channel potential and threshold voltage of triple material gate AlGaN/GaN HEMT including trapped and polarization-induced charges
    Bin Kashem, Md Tashfiq
    Subrina, Samia
    INTERNATIONAL JOURNAL OF NUMERICAL MODELLING-ELECTRONIC NETWORKS DEVICES AND FIELDS, 2019, 32 (01)
  • [27] Influence of the GaN cap layer thickness on the two- dimensional electron gas (2-DEG) sheet charge density of GaN/AlInN/GaN HEMTs with polarization effect
    Bellakhdar, A.
    Telia, A.
    DIGEST JOURNAL OF NANOMATERIALS AND BIOSTRUCTURES, 2022, 17 (01) : 233 - 246
  • [28] Threshold Voltage Control in AlGaN/GaN/AlGaN Double-Heterostructure MISHFET Utilizing 2-D Electron and Hole Gases
    Kirchbruecher, Arno
    Luekens, Gerrit
    Beckmann, Carsten
    Ehrler, Jasmin
    Shu, Qi
    Wieben, Jens
    Zweipfennig, Thorsten
    Kalisch, Holger
    Vescan, Andrei
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2025, 72 (03) : 1131 - 1140
  • [29] Investigation of the polarization-induced charges in modulation-doped AlxGa1-xN/GaN heterostructures through capacitance-voltage profiling and simulation
    Zhou, YG
    Shen, B
    Someya, T
    Yu, HQ
    Liu, J
    Zhou, HM
    Zhang, R
    Shi, Y
    Zheng, YD
    Arakawa, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (4B): : 2531 - 2535
  • [30] Effects of interface oxidation on the transport behavior of the two-dimensional-electron-gas in AlGaN/GaN heterostructures by plasma-enhanced-atomic-layer-deposited AIN passivation
    Huang, Sen
    Wei, Ke
    Tang, Zhikai
    Yang, Shu
    Liu, Cheng
    Guo, Lei
    Shen, Bo
    Zhang, Jinhan
    Kong, Xin
    Liu, Guoguo
    Zheng, Yingkui
    Liu, Xinyu
    Chen, Kevin J.
    JOURNAL OF APPLIED PHYSICS, 2013, 114 (14)