Effects of grinding parameters on surface quality in silicon nitride grinding

被引:116
作者
Liu, Wei [1 ]
Deng, Zhaohui [1 ]
Shang, Yuanyuan [1 ]
Wan, Linlin [1 ]
机构
[1] Hunan Univ Sci & Technol, Hunan Prov Key Lab High Efficiency & Precis Machi, Xiangtan 411201, Hunan, Peoples R China
基金
中国国家自然科学基金;
关键词
Silicon nitride; Grinding; Orthogonal experiment; Surface quality; DAMAGE FORMATION MECHANISMS; MATERIAL REMOVAL; BRITTLE MATERIALS;
D O I
10.1016/j.ceramint.2016.10.135
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
To reveal the effects of the grinding parameters on the ground surface quality of silicon nitride grinding to guide processing for improving the processing accuracy and productivity, orthogonal experiments on silicon nitride grinding are carried out by a diamond grinding wheel, and the effects are studied systematically. The influences of the grinding parameters, such as the grain size, wheel speed, workpiece speed and grinding depth, are analysed regarding their effects on the grinding force, surface morphology, surface roughness and subsurface damage. The undeformed chip thickness and equivalent chip thickness are also studied to provide a comprehensive analysis of the ground surface quality. The quality and effectiveness of silicon nitride grinding can be improved by optimizing the grinding parameters according to this study.
引用
收藏
页码:1571 / 1577
页数:7
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