Self-assembly of Si and SiOx nanostructures

被引：10

作者：

Chen, YJ ^{[1
]}

Li, JB ^{[1
]}

Han, YS ^{[1
]}

Dai, JH ^{[1
]}

机构：

[1] Tsing Hua Univ, Dept Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 2002年 / 21卷 / 02期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1023/A:1014261602564

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Self-assembly of Si and SiOx nanostructures formed by a simple thermal evaporation method was reported. A catalyst coated quartz glass substrate was prepared and three different zones were identified in the quartz substrate. The variety in the morphology of the products formed in the different zones indicated a diversity of growth conditions.

引用

页码：175 / 177

页数：3

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