Characteristics of deep UV optics at 193nm & 157nm

被引：3
|
作者：
Callahan, GP [1 ]
Flint, BK [1 ]
机构：
[1] Acton Res Corp, Acton, MA 01720 USA
来源：
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1998 | 1999年 / 3578卷
关键词：
ArF 193nm and F-2 157nm excimer lasers; Deep UV (DUV); microlithography; optical components; laser damage threshold;
D O I：
10.1117/12.344438
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The increasing use of Argon Fluoride (ArF) 193nm excimer lasers in microlithography, surgical procedures and other applications have created the requirement for an increasingly larger number of specialized optical components and thin film coatings. At 193nn these include coated components that can withstand long duration exposure to ultraviolet (UV) radiation without significant change in performance. Similar coatings and components for Fluorine (F-2) lasers operating at 157nm are under development. At these deep UV (DUV) wavelengths, potential coating materials as well as substrates are very limited due to absorption and impurities. Characteristics of various types of thin film coatings including reflective, anti-reflective, beam-splitting, beam attenuating and optical bandpass filters, at both 193nm and 157nm, are measured using a specially designed vacuum spectrophotometer system. Results of these measurements as well as plans for further coating development are presented.
引用
收藏
页码：45 / 53
页数：9
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