Highly electroconductive TiN/Si3N4 composite ceramics fabricated by spark plasma sintering of Si3N4 particles with a nano-sized TiN coating

被引：33

作者：

Kawano, S ^{[1
]}

Takahashi, J ^{[1
]}

Shimada, S ^{[1
]}

机构：

[1] Hokkaido Univ, Grad Sch Engn, Sapporo, Hokkaido 0608628, Japan

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2002年 / 12卷 / 02期

关键词：

D O I：

10.1039/b107058b

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Si3N4 particles coated with 20 nm TiN have been sintered by spark plasma sintering (SPS) at 1600degreesC. The 25 vol.% TiN ceramic achieved a relative density of 91% without sintering additives. TEM and HREM observations indicate that a glassy phase derived from the Si3N4 particles plays a role in densification. Ceramics derived from TiN/Si3N4 composite particles containing 25 and 32.5 vol.% TiN possess continuous TiN networks in a Si3N4 matrix and their electrical resistivity is of the order of 1 x 10(-4) Ohm cm, much lower than that of a mechanical mixture of nano-sized TiN particles and Si3N4 particles (1 Ohm cm).

引用

页码：361 / 365

页数：5

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