We reported the resistance switching (RS) behavior in the epitaxially grown CeO2/La-0.7(Sr0.1Ca0.9)(0.3)MnO3 (CeO2/LSCMO) heterojunctions on SrTiO3 substrate. The CeO2/LSCMO device displayed improved switching characteristics as compared to that of metal/manganite device. The switching threshold voltage showed a strong dependence on the thickness of the CeO2 layer, where a minimum/maximum thickness was required for the appearance of the resistance switching. Both set and reset threshold voltages increase with the increase of the CeO2 layer thickness due to the trap-assisted electron tunneling effect. In the meantime, the defects or vacancies in the CeO2 films, in particular, the concentration of the defects or vacancies in the interface between CeO2 and LSCMO, have a significant impact on the switching effect. These results suggest that the electron tunneling accompanied by a trapping/detrapping process at the interface is likely responsible for the RS effect in the insulator/manganite system. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4760221]
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Natl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, JapanNatl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, Japan
Sawa, A
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Fujii, T
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Kawasaki, M
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机构:Natl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, Japan
机构:Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
Shang, D. S.
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Wang, Q.
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Wang, Q.
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Chen, L. D.
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Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
Chen, L. D.
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Dong, R.
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Dong, R.
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Li, X. M.
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Li, X. M.
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Zhang, W. Q.
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机构:Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
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Natl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, JapanNatl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, Japan
Sawa, A
;
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h-index:
机构:
Fujii, T
;
Kawasaki, M
论文数: 0引用数: 0
h-index: 0
机构:Natl Inst Adv Ind Sci & Technol, Correlated Electron Res Ctr, Tsukuba, Ibaraki 3058562, Japan
机构:Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
Shang, D. S.
;
Wang, Q.
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h-index: 0
机构:Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
Wang, Q.
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Chen, L. D.
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Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
Chen, L. D.
;
Dong, R.
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h-index: 0
机构:Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
Dong, R.
;
Li, X. M.
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机构:Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
Li, X. M.
;
Zhang, W. Q.
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机构:Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China