GaN1-xSbx highly mismatched alloys grown by low temperature molecular beam epitaxy under Ga-rich conditions

被引:15
作者
Sarney, W. L. [1 ]
Svensson, S. P. [1 ]
Novikov, S. V. [2 ]
Yu, K. M. [3 ]
Walukiewicz, W. [3 ]
Foxon, C. T. [2 ]
机构
[1] US Army Res Lab, Adelphi, MD 20783 USA
[2] Univ Nottingham, Sch Phys & Astron, Nottingham NG7 2RD, England
[3] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
基金
英国工程与自然科学研究理事会;
关键词
Crystal structure; Molecular beam epitaxy; Semiconducting III-V materials; Nitrides;
D O I
10.1016/j.jcrysgro.2013.08.030
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The electronic structure of the conduction and valence bands of highly mismatched alloys (HMAs) such as GaN1-xSbx are well described by the band anticrossing model. The properties of this alloy, which has a large band gap range and controllable valence band positions, make it a candidate material for efficient solar energy conversion devices. We have examined the growth and structural properties of amorphous and crystalline GaN1-xSbx. These HMAs were grown by low temperature molecular beam epitaxy (MBE) under Ga-rich conditions. While there is a monotonic linear increase of Sb incorporation with Sb overpressure, there was no obvious dependence of Sb incorporation with growth temperature for the range of 10-470 degrees C. At growth temperatures lower than 100 degrees C, GaN1-xSx HMAs lose crystallinity and become amorphous for Sb compositions at or exceeding similar to 5%. Ga-rich growth resulted in strong absorption at energies as low as 1 eV for GaN1-xSbx alloys of all compositions. The strong low energy absorption may arise from a Ga-related defect band. Published by Elsevier B.V.
引用
收藏
页码:95 / 99
页数:5
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